IP Library Granted Patent US 9,246,473
Granted Patent B2
US 9,246,473 · App. 13/955,774 · Granted Jan 26, 2016

Acoustic resonator comprising collar, frame and perimeter distributed bragg reflector

Inventors: Dariusz Burak (Fort Collins, CO); John Choy (Westminster, CO); Phil Nikkel (Loveland, CO)
Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
H03H9/54H03H9/02118H03H9/173H03H9/175H03H9/587H03H9/589H03H9/585
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Quick Facts
Patent No.
US 9,246,473
App. No.
13/955,774
Granted
Jan 26, 2016
Kind
B2
Abstract

An acoustic resonator includes a bottom electrode disposed over a substrate, a piezoelectric layer disposed over the bottom electrode, a top electrode disposed over the piezoelectric layer, and a cavity disposed beneath the bottom electrode. An overlap of the bottom electrode, the piezoelectric layer and the top electrode defines a main membrane region of the acoustic resonator structure. The acoustic resonator further includes an acoustic reflector disposed over the substrate adjacent to the cavity, the acoustic reflector including a layer of low acoustic impedance material stacked on a layer of high acoustic impedance material.

Claims (62)

1. A bulk acoustic wave (BAW) resonator, comprising:

a bottom electrode disposed over a substrate;

a piezoelectric layer disposed over the bottom electrode;

a top electrode disposed over the piezoelectric layer, wherein an overlap of the bottom electrode, the piezoelectric layer and the top electrode defines a main membrane region of the acoustic resonator structure;

a cavity disposed beneath the bottom electrode;

an acoustic reflector disposed over the substrate, and adjacent to the cavity, the acoustic reflector comprising a layer of low acoustic impedance material stacked over a layer of high acoustic impedance material, wherein a thickness of the acoustic reflector is substantially the same as a depth of the cavity, or greater than the depth of the cavity; and

a planarization layer disposed over a portion of the acoustic reflector, and adjacent to the bottom electrode.

2. The BAW resonator as claimed in claim 1 , wherein the acoustic reflector is disposed around a perimeter of the air cavity.

3. The BAW resonator of claim 1 , further comprising:

a frame disposed within the main membrane region and having an outer edge substantially aligned with a boundary of the main membrane region.

4. The BAW resonator of claim 3 , wherein the frame is disposed at a bottom portion of the top electrode.

5. The BAW resonator of claim 3 , wherein the frame is disposed at a bottom portion of the bottom electrode.

6. The BAW resonator of claim 3 , wherein the frame is disposed at a top portion of the bottom electrode.

7. The BAW resonator of claim 1 , further comprising:

a collar formed separate from the frame, disposed outside the main membrane region, and having an inner edge substantially aligned with the boundary of or overlapping the main membrane region.

8. The BAW resonator of claim 7 , wherein the planarization is the first planarization layer, and the BAW resonator further comprises:

a second planarization layer disposed over the piezoelectric layer, and adjacent to the top electrode, wherein the collar is disposed over the second planarization layer and the top electrode.

9. The BAW resonator of claim 7 , wherein the collar is disposed between the bottom electrode and the piezoelectric layer.

10. The BAW resonator of claim 7 , wherein the collar is disposed between the bottom electrode and the acoustic reflector.

11. The BAW resonator of claim 3 , further comprising;

an additional frame disposed within the main membrane region and having an outer edge substantially aligned with the boundary of the main membrane region, wherein the frame is disposed at a bottom portion of the top electrode and the additional frame is disposed at one of a bottom portion or a top portion of the bottom electrode.

12. The BAW resonator of claim 3 , wherein the frame comprises a composite frame.

13. The BAW resonator of claim 1 , wherein the acoustic reflector comprises a distributed Bragg reflector (DBR).

14. A bulk acoustic wave (BAW) resonator, comprising:

an acoustic reflector disposed over a substrate around a perimeter of a cavity, a thickness of the acoustic reflector being substantially the same as a depth of the cavity;

a bottom electrode disposed over the acoustic reflector and the cavity;

a piezoelectric layer disposed over the bottom electrode;

a top electrode disposed over the piezoelectric layer, wherein an overlap of the bottom electrode, the piezoelectric layer and the top electrode defines a main membrane region of the acoustic resonator structure;

a frame disposed within the main membrane region and having an outer edge substantially aligned with a boundary of the main membrane region; and

a collar disposed outside the main membrane region and having an inner edge substantially aligned with the boundary of or overlapping the main membrane region.

15. The BAW resonator of claim 14 , wherein the acoustic reflector comprises at least one layer of low acoustic impedance material and at least one layer of high acoustic impedance material.

16. The BAW resonator of claim 15 , wherein the collar comprises borosilicate glass, carbon-doped silicon oxide, silicon carbide, silicon nitride, aluminum oxide, aluminum nitride, zinc oxide, lead zirconium titanate, diamond or diamond-like carbon, and

wherein the frame comprises at least one layer of copper, molybdenum, aluminum, tungsten, iridium, borosilicate glass, carbon-doped silicon oxide, silicon carbide, silicon nitride, aluminum oxide, aluminum nitride, zinc oxide, lead zirconium titanate, diamond or diamond-like carbon.

17. The RAW resonator of claim 16 , further comprising a planarization layer disposed over the piezoelectric layer, and adjacent to the top electrode.

18. The RAW resonator of claim 17 , wherein the collar is disposed over the planarization layer and the top electrode.

19. The RAW resonator of claim 14 , further comprising a planarization layer disposed over the piezoelectric layer, and adjacent to the top electrode.

20. The RAW resonator of claim 19 , wherein the collar is disposed over the planarization layer and the top electrode.

21. A bulk acoustic wave (BAW) resonator, comprising:

an acoustic reflector disposed over a substrate around a perimeter of a cavity, the acoustic reflector comprising at least one layer of low acoustic impedance material, a thickness of the acoustic reflector being substantially the same as a depth of the cavity;

a bottom electrode disposed over the acoustic reflector and the cavity;

a piezoelectric layer disposed over the bottom electrode;

a top electrode disposed over the piezoelectric layer, wherein an overlap of the bottom electrode, the piezoelectric layer and the top electrode defines a main membrane region of the acoustic resonator structure;

a frame disposed within the main membrane region and having, an outer edge substantially aligned with a boundary of the main membrane region; and

a collar disposed outside the main membrane region and having an inner edge substantially aligned with the boundary of or overlapping the main membrane region.

22. The BAW resonator of claim 21 , wherein the collar is disposed between the bottom electrode and the piezoelectric layer.

23. The BAW resonator of claim 21 , wherein the collar is disposed between the bottom electrode and the acoustic reflector.

24. The BAW resonator of claim 21 , wherein the frame comprises a composite frame.

25. The BMW resonator of claim 21 , wherein the acoustic reflector comprises a distributed Bragg reflector (DBR).

26. A bulk acoustic wave (BAW) resonator, comprising:

a bottom electrode disposed over a substrate;

a piezoelectric layer disposed over the bottom electrode;

a top electrode disposed over the piezoelectric layer, wherein an overlap of the bottom electrode, the piezoelectric layer and the top electrode defines a main membrane region of the acoustic resonator structure;

a cavity disposed beneath the bottom electrode;

an acoustic reflector disposed over the substrate, and adjacent to the cavity, the acoustic reflector comprising a layer of low acoustic impedance material stacked over a layer of high acoustic impedance material;

a frame disposed within the main membrane region and having an outer edge substantially aligned with a boundary of the main membrane region;

a collar, separate from the frame, disposed outside the main membrane region, and having an inner edge substantially aligned with the boundary of the main membrane region, or overlapping the main membrane region; and

a planarization layer disposed over a portion of the acoustic reflector, and adjacent to the bottom electrode.

27. The RAW resonator of claim 26 , wherein the collar is disposed between the bottom electrode and the piezoelectric layer.

28. The BAW resonator of claim 26 , wherein the collar is disposed between the bottom electrode and the acoustic reflector.

29. The RAW resonator of claim 26 , wherein the frame comprises a composite frame.

30. The RAW resonator of claim 26 , wherein the acoustic reflector comprises a distributed Bragg reflector (DBR).

31. The RAW resonator of claim 26 , wherein the planarization layer is a first planarization layer, and the RAW resonator comprises a second planarization layer disposed over the piezoelectric layer, and adjacent to the top electrode, wherein the collar is disposed over the planarization layer and the top electrode.

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED AT REEL: 047422 FRAME: 0464. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Mar 6, 2019
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 048883/0702 →
MERGER Recorded Oct 5, 2018
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE. LIMITED
Reel/Frame 047422/0464 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS Recorded Feb 3, 2017
From: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 041710/0001 →
PATENT SECURITY AGREEMENT Recorded Feb 11, 2016
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 037808/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENT RIGHTS (RELEASES RF 032851-0001) Recorded Feb 2, 2016
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 037689/0001 →
PATENT SECURITY AGREEMENT Recorded May 8, 2014
From: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 032851/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 31, 2013
From: BURAK, DARIUSZ; CHOY, JOHN; NIKKEL, PHIL
To: AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
Reel/Frame 030916/0162 →
Continuity (5)
Continuation In Part 13781491 · Feb 28, 2013
Continuation In Part 13663449 · Oct 29, 2012
Continuation In Part 13208883 · Aug 12, 2011
Continuation In Part 13074262 · Mar 29, 2011
Related Publication 20130314177A1 · Nov 28, 2013