Sputtering target for magnetic recording film
A sputtering target for a magnetic recording film which contains carbon, the sputtering target is characterized in that the ratio (I G /I D ) of peak intensities of the G-band to the D-band in Raman scattering spectrometry is 5.0 or less. The sputtering target for a magnetic recording film, which contains carbon powders dispersed therein, makes it possible to produce a magnetic thin film having a granular structure without using an expensive apparatus for co-sputtering; and in particular, the target is an Fe—Pt-based sputtering target. Carbon is a material which is difficult to sinter and has a problem that carbon particles are apt to form agglomerates. There is hence a problem that carbon masses are readily detached during sputtering to generate a large number of particles on the film after sputtering. The high-density sputtering target can solve these problems.
1. A sputtering target for a magnetic recording film, the sputtering target having a composition comprising 5 mol % or more and 60 mol % or less of Pt, 20 mol % or more and 70 mol % or less of C, and the balance of Fe, and having a ratio (I G /I D ) of a peak intensity of G-band (I G ) to a peak intensity of D-band (I D ) of 5.0 or less in Raman scattering spectrometry of the sputtering target, and having a relative density of 90% or more.
2. A sputtering target for a magnetic recording film, the sputtering target having a composition comprising 0.5 mol % or more and 20 mol % or less of at least one element selected from the group consisting of B, Ru, Ag, Au, and Cu, 5 mol % or more and 60 mol % or less of Pt, 20 mol % or more and 70 mol % or less of C, and Fe, and having a ratio (I G /I D ) of a peak intensity of G-band (I G ) to a peak intensity of D-band (I D ) of 5.0 or less in Raman scattering spectrometry of the sputtering target.
3. The sputtering target for a magnetic recording film according to claim 2 , wherein the sputtering target further comprises 0.5 mol % or more and 20 mol % or less of at least one oxide selected from the group consisting of SiO 2 , Cr 2 O 3 , CoO, Ta 2 O 5 , B 2 O 3 , MgO, and Co 3 O 4 .
4. The sputtering target for a magnetic recording film according to claim 2 , wherein the sputtering target has a relative density of 90% or more.
5. A sputtering target for a magnetic recording film, the sputtering target having a composition comprising 0.5 mol % or more and 20 mol % or less of at least one oxide selected from the group consisting of SiO 2 , Cr 2 O 3 , CoO, Ta 2 O 5 , B 2 O 3 , MgO, and Co 3 O 4 , 5 mol % or more and 60 mol % or less of Pt, 20 mol % or more and 70 mol % or less of C, and the balance of Fe, and having a ratio (I G /I D ) of a peak intensity of G-band (I G ) to a peak intensity of D-band (I D ) of 5.0 or less in Raman scattering spectrometry of the sputtering target.
6. The sputtering target for a magnetic recording film according to claim 5 , wherein the sputtering target has a relative density of 90% or more.
7. The sputtering target according to claim 1 , wherein the 20 mol % or more and 70 mol % or less of C is in the form of carbon black.
8. The sputtering target according to claim 1 , wherein the 20 mol % or more and 70 mol % or less of C is in the form of glassy carbon.
9. The sputtering target according to claim 1 , wherein the 20 mol % or more and 70 mol % or less of C is in the form of graphite.
10. The sputtering target according to claim 1 , wherein the sputtering target is a sintered compact of raw material powders having been mixed, pulverized, compacted, and sintered.