IP Library Granted Patent US 9,024,429
Granted Patent B2
US 9,024,429 · App. 14/013,923 · Granted May 5, 2015

Microelectronic packages containing opposing devices and methods for the fabrication thereof

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Quick Facts
Patent No.
US 9,024,429
App. No.
14/013,923
Granted
May 5, 2015
Kind
B2
Abstract

Microelectronic packages and methods for fabricating microelectronic packages are provided. The fabrication method may be carried-out utilizing a preformed panel having a frontside cavity and a backside cavity in which first and second microelectronic devices are positioned, respectively. One or more frontside RDL layers are produced over the frontside of the preformed panel in ohmic contact with or otherwise electrically coupled to the first microelectronic device. Similarly, one or more backside RDL layers are formed over the backside of the preformed panel in ohmic contact with or otherwise electrically coupled to the second microelectronic device. A frontside contact array is produced over the frontside of the preformed panel and electrically coupled to at least the first microelectronic device through the frontside RDL layers. Lastly, the preformed panel is singulated to yield a microelectronic package including a package body in which the first and second microelectronic devices are embedded.

Claims (49)

1. A method for fabricating a microelectronic package using a preformed panel having at least one frontside cavity and at least one backside cavity, the method comprising:

positioning first and second microelectronic devices in the frontside and backside cavities of the preformed panel, respectively, a circumferential clearance provided around the first microelectronic device when positioned within the frontside cavity;

producing one or more frontside redistribution layers over the frontside of the preformed panel electrically coupled to the first microelectronic device, the circumferential clearance at least partially filled with a photoimagable dielectric material during the production of the frontside redistribution layers;

producing one or more backside redistribution layers over the backside of the preformed panel electrically coupled to the second microelectronic device;

forming a frontside contact array over the frontside of the preformed panel and electrically coupled to at least the first microelectronic device through the frontside redistribution layers; and

singulating the preformed panel to yield a microelectronic package including a package body in which the first and second microelectronic devices are embedded.

2. The method of claim 1 wherein the first and second microelectronic devices comprise first and second semiconductor die each having an active surface over which a plurality of bond pads is formed, and wherein positioning comprises placing the first and second semiconductor die such that their respective active surfaces face in opposing directions.

3. The method of claim 1 wherein positioning comprises placing the first and second microelectronic devices in a back-to-back relationship.

4. The method of claim 1 wherein positioning comprises placing the first and second microelectronic devices in substantial alignment, as taken along an axis orthogonal to the frontside of the preformed panel.

5. The method of claim 1 further comprising forming a backside contact array over the backside of the preformed panel and electrically coupled to at least the second microelectronic device through the backside redistribution layers.

6. The method of claim 1 wherein the preformed panel is produced utilizing a molding process.

7. The method of claim 1 wherein the first microelectronic device comprises a semiconductor die having an active side over which a plurality of bond pads is formed, and wherein the frontside redistribution layers are produced over the active side of the semiconductor die and in ohmic contact with the bond pads.

8. The method of claim 7 wherein the active side of the semiconductor die is substantially coplanar with the frontside of the preformed panel when the semiconductor is positioned within the frontside cavity.

9. The method of claim 1 wherein the preformed panel is formed to include at least one prefabricated through package via, and wherein the frontside redistribution layers are produced in ohmic contact with the prefabricated through package via.

10. The method of claim 9 wherein the prefabricated through package via is molded into the preformed panel.

11. The method of claim 1 wherein the frontside redistribution layers are fabricated to include a first metal level, and wherein the method further comprises forming at least one through package via extending through the prefabricated package body and through the first metal level.

12. The method of claim 10 wherein forming at least one through package via comprises:

laser drilling an opening extending through first metal level and through the through package via; and

filling the opening with an electrically-conductive paste.

13. The method of claim 1 wherein the frontside and backside redistribution layers each comprise at least one metal level, and wherein the method further comprises forming at least one through package via extending from the outermost metal level of the frontside redistribution layers to the outermost metal level of the backside redistribution layers.

14. The method of claim 1 wherein the preformed panel is fabricated to include a partition wall separating the frontside cavity and the backside cavity, and wherein positioning the first and second microelectronic devices comprises:

bonding the first microelectronic device to a first surface of the partition wall; and

bonding the second microelectronic device to a second, opposing surface of the partition wall.

15. The method for fabricating a microelectronic package using a preformed panel having at least one frontside cavity and at least one backside cavity, the method comprising:

positioning first and second microelectronic devices in the frontside and backside cavities of the preformed panel, respectively;

producing one or more frontside redistribution layers over the frontside of the preformed panel electrically coupled to the first microelectronic device and comprising at least one metal level;

producing one or more backside redistribution layers over the backside of the preformed panel electrically coupled to the second microelectronic device and comprising at least one metal level;

forming at least one electrically inactive through package via extending from the outermost metal level of the frontside redistribution layers to the outermost metal level of the backside redistribution layers;

forming a frontside contact array over the frontside of the preformed panel and electrically coupled to at least the first microelectronic device through the frontside redistribution layers; and

singulating the preformed panel to yield a microelectronic package including a package body in which the first and second microelectronic devices are embedded.

16. A method for fabricating a microelectronic package using a preformed panel having at least one frontside cavity and at least one backside cavity, the frontside cavity connecting with the backside cavity to form an opening extending through the preformed panel, the method comprising:

positioning first and second microelectronic devices in the frontside and backside cavities of the preformed panel, respectively, positioning the first and second microelectronic devices comprising:

bonding the first microelectronic device to the second microelectronic device to produce a back-to-back device stack; and

positioning the back-to-back device stack in the opening;

producing one or more frontside redistribution layers over the frontside of the preformed panel electrically coupled to the first microelectronic device;

producing one or more backside redistribution layers over the backside of the preformed panel electrically coupled to the second microelectronic device;

forming a frontside contact array over the frontside of the preformed panel and electrically coupled to at least the first microelectronic device through the frontside redistribution layers; and

singulating the preformed panel to yield a microelectronic package including a package body in which the first and second microelectronic devices are embedded.

17. A microelectronic package, comprising:

a preformed package body having a frontside cavity and a backside cavity;

a first microelectronic device disposed within the frontside cavity;

a clearance provided between the first microelectronic device and sidewalls of the preformed package body defining the frontside cavity;

a second microelectronic device disposed within the backside cavity;

one or more frontside redistribution layers over the preformed package body in ohmic contact with the first microelectronic device, the frontside redistribution layers comprising a dielectric material filling the clearance and surrounding the first microelectronic device;

one or more backside redistribution layers over the preformed package body in ohmic contact with the first microelectronic device; and

a frontside contact array disposed over the frontside of the preformed package body and electrically coupled to at least the first microelectronic device through the frontside redistribution layers.

18. The microelectronic package of claim 17 wherein the first and second microelectronic devices are positioned in a back-to-back relationship.

19. The microelectronic package of claim 18 wherein a backside of the first microelectronic device is bonded to a backside of the second microelectronic device.

20. The microelectronic package of claim 18 wherein the preformed package body includes a partition wall separating the frontside cavity and the backside cavity, and wherein the first and second microelectronic devices are bonded to opposing surfaces of the partition wall.

Assignments (18)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE TO CORRECT THE APPLICATION NO. FROM 13,883,290 TO 13,833,290 PREVIOUSLY RECORDED ON REEL 041703 FRAME 0536. ASSIGNOR(S) HEREBY CONFIRMS THE THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS.. Recorded Feb 20, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: SHENZHEN XINGUODU TECHNOLOGY CO., LTD.
Reel/Frame 048734/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040632 FRAME: 0001. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME. Recorded Sep 21, 2017
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 044209/0047 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE PATENTS 8108266 AND 8062324 AND REPLACE THEM WITH 6108266 AND 8060324 PREVIOUSLY RECORDED ON REEL 037518 FRAME 0292. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Feb 1, 2017
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 041703/0536 →
CHANGE OF NAME Recorded Nov 8, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: NXP USA, INC.
Reel/Frame 040632/0001 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PCT NUMBERS IB2013000664, US2013051970, US201305935 PREVIOUSLY RECORDED AT REEL: 037444 FRAME: 0787. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS. Recorded Oct 17, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 040450/0715 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 13, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037518/0292 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 5, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037444/0787 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0874 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031627/0201 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 13, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 031627/0158 →
SECURITY AGREEMENT Recorded Nov 6, 2013
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 031591/0266 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 29, 2013
From: YAP, WENG F.
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 031112/0759 →