Transferable transparent conductive oxide
A method for fabricating a photovoltaic device includes forming an adhesion layer on a substrate, forming a material layer on the adhesion layer and applying release tape to the material layer. The substrate is removed at a weakest interface between the adhesion layer and the substrate by mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the material layer and the release tape. The transfer substrate is transferred to a target substrate to contact the adhesion layer to the target substrate. The transfer substrate includes a material sensitive to formation processes of the transfer substrate such that exposure to the formation processes of the transfer substrate is avoided by the target substrate.
1. A method for fabricating a photovoltaic device, comprising:
forming an adhesion layer on a substrate;
forming a material layer on the adhesion layer;
applying release tape to the material layer;
removing the substrate at a weakest interface between the adhesion layer and the substrate by mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the material layer and the release tape; and
transferring the transfer substrate to a target substrate to contact the adhesion layer to the target substrate, the target substrate including a material sensitive to formation processes of the transfer substrate, such that exposure to the formation processes of the transfer substrate is avoided by the target substrate.
2. The method as recited in claim 1 , wherein forming the adhesion layer includes forming a layer of one or more of: gold, silver, copper and platinum, graphene and carbon nanotubes.
3. The method as recited in claim 1 , wherein forming the material layer includes forming one or more of: a transparent conductor, a multi-layer structure, device structures, and a metal grid.
4. The method as recited in claim 1 , wherein the sensitive material includes an organic photovoltaic layer.
5. The method as recited in claim 4 , wherein the target substrate includes a transparent conductor.
6. The method as recited in claim 1 , wherein the sensitive material is exposed to temperatures not exceeding 120 degrees Celsius.
7. The method as recited in claim 1 , further comprising: removing the release tape using heat.
8. A method for fabricating a photovoltaic device, comprising:
forming a metal adhesion layer on a substrate;
forming a first transparent conductor layer on the adhesion layer;
applying thermal release tape to the first transparent conductor layer;
mechanically peeling the thermal release tape to remove the substrate at a weakest interface between the adhesion layer and the substrate;
forming a sensitive material on a second transparent conductor layer; and
bonding the adhesion layer to the sensitive material to form a photovoltaic device such that the sensitive material avoids exposure to formation processes of the adhesion layer and the first transparent conductor layer.
9. The method as recited in claim 8 , wherein forming the metal adhesion layer includes forming a layer of one or more of: gold, silver, copper and platinum.
10. The method as recited in claim 8 , further includes forming a metal grid on the first transparent conductor.
11. The method as recited in claim 8 , wherein the sensitive material includes an organic photovoltaic layer.
12. The method as recited in claim 8 , further comprising etching the adhesion layer prior to bonding to reduce its thickness.
13. The method as recited in claim 8 , wherein the sensitive material is exposed to temperatures not exceeding 120 degrees Celsius.
14. The method as recited in claim 8 , further comprising: removing the thermal release tape using heat.
15. The method as recited in claim 8 , wherein bonding includes one or more of applying pressure, applying adhesive and chemically bonding the adhesion layer to the sensitive material.