Aryl acetate onium materials
View Patent ↗Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.
1. An acid generator comprising a structure of Formula (V):
wherein:
Z is a counter anion;
R 2 is H or is a group comprising an acid-labile moiety;
each T, each T′ and each T″ are the same or different non-hydrogen substituent, wherein either of T and T″ or T and T′ are capable of joining to form a ring;
n is 0, 1, 2, 3 or 4;
n′ and n″ are each independently 0, 1, 2, 3, 4 or 5;
J represents a chemical bond, or a group capable of covalently linking B and C;
D and D′ are the same or different and are each hydrogen or a non-hydrogen substituent, and optionally taken together may form a ring; and
A, B, and C are the same or different optionally substituted carbocyclic aryl or optionally substituted heteroaromatic group.
2. A photoresist composition comprising one or more acid generators of claim 1 .
3. A method for providing a photoresist relief image, comprising:
a) applying a coating layer of a photoresist composition of claim 2 on a substrate; and
b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.
4. An acid generator comprising a structure of Formula (VII):
wherein:
Z is a counter anion;
R 2 is hydrogen or a non-hydrogen substituent;
each T, each T′ and each T″ are the same or different non-hydrogen substituent, wherein either of T and T″ or T and T′ are capable of joining to form a ring;
n is 0, 1, 2, 3 or 4;
n′ and n″ are each independently 0, 1, 2, 3, 4 or 5;
J represents a chemical bond, or a group capable of covalently linking B and C;
Q is a C 1 -C 8 alkylene group which may be fully or partially saturated, any of the carbon groups may be substituted with a carbonyl, oxygen, nitrogen, sulfur or any combination of carbonyl, oxygen, nitrogen, sulfur; a C 1 to C 30 aliphatic hydrocarbon group, a C 6 to C 30 aromatic hydrocarbon group, a C 1 to C 30 cyclic hydrocarbon group, a C 1 to C 30 polycyclic hydrocarbon group, a C 5 to C 30 heteroaromatic group; and
A, B, and C are the same or different optionally substituted carbocyclic aryl or optionally substituted heteroaromatic group.
5. A photoresist composition comprising one or more acid generators of claim 4 .
6. A method for providing a photoresist relief image, comprising:
a) applying a coating layer of a photoresist composition of claim 5 on a substrate; and
b) exposing the photoresist composition layer to activating radiation and developing the exposed photoresist composition coating layer.