Common fill of gate and source and drain contacts
View Patent ↗A semiconductor structure includes a source region, a drain region, a channel region and a gate region over a bulk silicon substrate. The gate region further includes a dielectric layer and one or more work function layers disposed over the dielectric layer. A first filler material, such as a flowable oxide is provided over the source region and the drain region. A second filler material, such as an organic material, is provided within the gate region. The first filler material and the second filler material are selectively removed to create, source, drain and gate openings. The gate, source and drain openings are filled simultaneously with a metal, such as tungsten, to create a metal gate structure, source contact and drain contact.
1. A method comprising:
providing a semiconductor structure, the structure comprising: a semiconductor substrate; a source region, a drain region and a channel region between the source region and the drain region; a gate region electrically coupled to the channel region; a source contact region electrically coupled to the source region; and a drain contact region electrically coupled to the drain region; wherein adjacent gate and contact regions are separated by spacers;
filling the source and drain contact regions with a first filler material;
filling the gate region with a second filler material that is planarizable and removable selective to the first filler material;
creating a blanket layer of the second filler material over the filled regions;
removing the second filler material layer selective to the first filler material from over the source and drain contact regions;
removing the first filler material from the source and drain contact regions after removing the second filler material layer thereover; and
simultaneously filling the gate region and the source and drain contact regions with a conductive material.
2. The method of claim 1 , wherein the semiconductor substrate comprises a bulk semiconductor substrate.
3. The method of claim 1 , wherein the conductive material comprises a metal.
4. The method of claim 3 , wherein the metal comprises tungsten.
5. The method of claim 1 , wherein the first filler material comprises an oxide, and wherein the second filler material comprises a non-oxide.
6. The method of claim 1 , wherein the semiconductor structure comprises one or more semiconductor fins coupled to the substrate, wherein the source region, drain region and channel region are situated across a top portion of the one or more fins, and wherein the gate region encompasses the channel region.
7. A method comprising:
providing a semiconductor structure, the structure comprising: a semiconductor substrate; a source region, a drain region and a channel region between the source region and the drain region; a gate region above the channel region; a source contact region; and a drain contact region; wherein adjacent gate and contact regions are separated by spacers;
filling the source and drain contact regions with a first filler material; filling the gate region with a second filler material that is planarizable and removable selective to the first filler material; creating a blanket layer of the second filler material over the filled regions; removing the second filler material layer selective to the first filler material from over the source and drain contact regions; removing the first filler material from the source and drain contact regions after removing the second filler material layer thereover; and simultaneously filling the gate region and the source and drain contact regions with a conductive material.
8. The method of claim 7 , wherein the semiconductor substrate comprises a bulk semiconductor substrate.
9. The method of claim 7 , wherein the conductive material comprises a metal.
10. The method of claim 9 , wherein the metal comprises tungsten.
11. The method of claim 7 , wherein the first filler material comprises an oxide, and wherein the second filler material comprises a non-oxide.
12. The method of claim 7 , wherein the semiconductor structure comprises one or more semiconductor fins coupled to the substrate, wherein the source region, drain region and channel region are situated across a top portion of the one or more fins, and wherein the gate region encompasses the channel region.
13. The method of claim 7 , further comprising: electrically coupling the conductive-material-filled gate region and the channel region; electrically coupling the conductive-material-filled source region and the conductive-material-filled source contact region; and electrically coupling the conductive-material-filled drain region and the conductive-material-filled drain contact region.