Photoresist and coated substrate comprising same

1. A photoresist composition, comprising:

an acid sensitive polymer comprising acid sensitive groups and lactone-containing groups,

a photoacid generator, and

a polymeric quencher comprising the polymerized product of a nitrogen-containing monomer having the formula (Ic), and an acid-deprotectable monomer having the formula (II):

wherein:

each R a is independently H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl;

LN is

wherein each R e is independently halogen or OR′, where R′ is H or C 1-10 alkyl, and b is an integer of 1 to 9;

each R c is independently C 1-10 alkyl, C 3-20 cycloalkyl, or C 3-20 heterocycloalkyl, wherein each R c is separate or at least one R c is attached to an adjacent R c ; and

each R d is independently C 1-10 alkyl, C 3-20 cycloalkyl, or C 3-20 heterocycloalkyl, and each R d is separate or at least one R d is attached to an adjacent R d .

2. The photoresist composition of claim 1 , wherein the acid deprotectable monomer of formula (II) is

or a combination comprising at least one of the foregoing, wherein each R a is independently H or C 1-4 alkyl.

3. The photoresist composition of claim 1 , wherein the polymeric quencher further comprises the polymerized product of a base-soluble monomer of formula (IV):

wherein

R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl;

L 3 is a linear or branched C 1-20 alkylene, or C 3-20 cycloalkylene; and

Z is

wherein R f is a C 1-4 perfluoroalkyl group, and c is an integer from 1 to 3.

4. The photoresist composition of claim 3 , wherein the base-soluble monomer is:

or a combination comprising at least one of the foregoing monomers,

wherein R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl, and R f is a C 1-4 perfluoroalkyl group.

5. The photoresist composition of claim 1 , wherein the polymeric quencher further comprises the polymerized product of a surface-active monomer of formula (V):

wherein

R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl;

L 4 is a d+1 valent C 2-20 alkylene group or C 3-20 cycloalkylene group;

each R g is independently a C 1-22 alkyl, a C 1-4 fluoroalkyl, —(O—(CH 2 ) x ) y —R″ where x is an integer of 2 to 10, y is an integer from 1 to 20, R″ is H, OH or a C 1-10 alkoxy group, and each R g is optionally substituted with a functional group comprising an ether group, ester group, ketone group, OH group, or combination comprising at least one of the foregoing functional groups; and

d is an integer from 1 to 20.

6. The photoresist composition of claim 5 , wherein the surface active monomer of formula (V) is

or a combination comprising at least one of the foregoing,

wherein

R a is H, F, C 1-10 alkyl, or C 1-10 fluoroalkyl; and

each R g is independently a C 1-10 fluoroalkyl group.

7. A coated substrate, comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of claim 1 over the one or more layers to be patterned.