Method for electrically connecting wafers using butting contact structure and semiconductor device fabricated through the same
The present invention relates to a method for electrically connecting wafers, which physically bonds two wafers through an oxide-to-oxide bonding method and then electrically connects the two wafers through a butting contact structure. The wafers are physically bonded to each other through a relatively simple method, and then electrically connected to through TSVs or butting contact holes. Therefore, since the fabrication process may be simplified, a process error may be reduced, and the product yield may be improved.
1. A method for electrically connecting wafers, which electrically connects first and second wafers subjected to a series of processes using a butting contact structure, the method comprising:
physically bonding the first and second wafers through an insulator-to-insulator bonding method; and
electrically connecting a first conductive region of the first wafer to a second conductive region of the second wafer corresponding to the first conductive region through a metal-to-metal bonding method using through-silicon vias (TSVs) or butting contact holes;
wherein the electrically-connecting of the first conductive region of the first wafer to the second conductive region of the second wafer comprises:
forming a butting contact hole to reach the second conductive region through the substrate bottom of the first wafer and the first conductive region;
filling a conductive material into a part of the butting contact hole corresponding to the first conductive region and a region between the first and second conductive regions; and
filling an insulating material into the other part of the butting contact hole in which the conductive material is not filled.
2. The method of claim 1 , wherein the forming of the butting contact hole comprises:
forming a first butting contact hole to reach the first conductive region through the substrate bottom of the first wafer; and
forming a second butting contact hole to reach the second conductive region through the first conductive region.
3. The method of claim 2 , wherein the filling of the insulating material comprises filling an insulating material into the first butting contact hole, and
the filling of the conductive material comprises filling a conductive material into the second butting contact hole.
4. The method of claim 3 , wherein the first butting contact hole has a larger cross-sectional area than the second butting contact hole.
5. The method of claim 1 , further comprising removing the substrate bottom of the first wafer to a predetermined thickness by grinding the substrate bottom of the first wafer.
6. The method of claim 5 , wherein the removing of the substrate bottom of the first wafer is performed before the physically-bonding of the first and second wafers or performed before the electrically-bonding of the first conductive region of the first wafer to the second conductive region of the second wafer after the physically-bonding of the first and second wafers.
7. The method of claim 1 , wherein the physically-bonding of the first and second wafers comprises physically bonding the first and second wafers through an oxide-to-oxide bonding method.
8. A semiconductor device comprising first and second wafers which are electrically connected to each other through the method of claim 1 ,
wherein the first wafer comprises one or more of a plurality of elements constituting a CMOS image sensor, and
the second wafer comprises a pixel driving circuit and the other elements of the plurality of elements constituting the CMOS image sensor excluding the elements formed in the first wafer.
9. The semiconductor device of claim 8 , wherein the first wafer comprises a photodiode to generate charges corresponding to incident light among the plurality of elements constituting the CMOS image sensor.