Method and system for supplying a cleaning gas into a process chamber
A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region.
1. A processing chamber comprising:
a chamber body defining at least a first processing region and a second processing region, wherein the chamber body has:
a first entry port formed above the first processing region and coupled to a first gas distribution assembly disposed over a top portion of the first processing region;
a second entry port formed above the second processing region and coupled to a second gas distribution assembly disposed over a top portion of the second processing region;
a first vertical passage extending downward through a chamber wall;
one or more first cross channels open to a bottom portion of the first processing region and intersecting the first vertical passage;
a second vertical passage extending downward through the chamber wall; and
one or more second cross channels open to a bottom portion of the second processing region and intersecting the second vertical passage;
a remote plasma source configured to provide a plasma towards the top portions of the first and second processing regions;
a first gas conduit connecting the remote plasma source to the first and second entry ports; and
a valve having an inlet coupled to the first gas conduit and at least one outlet coupled to the first and second vertical passages, wherein opening of the valve selectively diverts a portion of the plasma from the remote plasma source to the bottom portions of the first and second processing regions.
2. The processing chamber of claim 1 , further comprising a processing gas source coupled to the first gas conduit.
3. The processing chamber of claim 1 , further comprising a second gas conduit connecting between the valve and the first and second vertical passages.
4. The processing chamber of claim 1 , wherein the valve comprises:
a valve body;
a movable flapper housed by the valve body; and
a coupling mechanism disposed outside the valve body operable to rotate the movable flapper.
5. The processing chamber of claim 4 , wherein the movable flapper comprises
a flow-obstructing plate; and
an outer body attached to the flow-obstructing plate, wherein at least one magnet is encased in the outer body of the movable flapper.
6. The processing chamber of claim 4 , wherein the coupling mechanism is configured to rotate the movable flapper through magnetic interaction.
7. The processing chamber of claim 5 , wherein the valve further comprises a seal cup securely fixed to the valve body, and the outer body of the movable flapper is cylindrical and surrounded by the seal cup.
8. The process chamber of claim 7 , wherein the valve further comprises a bearing interfacing between the outer body and the seal cup.
9. The processing chamber of claim 7 , wherein the coupling mechanism comprises a U-shaped body having magnetized end portions, and the coupling mechanism is positioned outside the seal cup with the magnetized end portions facing two opposite poles of the at least one magnet encased in the outer body.
10. The processing chamber of claim 9 , wherein the valve further comprises an actuator mounted to the valve, the actuator is one of a solenoid, air motor, electric motor, and pneumatic cylinder, and the actuator rotates the coupling mechanism in a controlled manner.
11. A processing chamber comprising:
a chamber body comprising chamber walls, a chamber lid and a chamber bottom defining a first processing region and a second processing region, wherein each of the first and second processing regions includes:
an entry port formed through the chamber lid; and
a vertical passage extending downward through the chamber wall and opens to the corresponding processing region;
a first gas conduit connecting a gas source to the entry ports of the first and second processing region, wherein the first gas conduit delivers one or more processing gases from the gas source to the first and second processing regions through the entry ports; and
a valve coupled between the first gas conduit and the vertical passages of the first and second processing regions, wherein opening of the valve selectively diverts a portion of the one or more processing gases from the gas source to the first and second processing regions through the vertical passages, wherein the valve comprises:
a valve body;
a movable flapper housed by the valve body; and
a coupling mechanism disposed outside the valve body operable to rotate the movable flapper.
12. The processing chamber of claim 11 , wherein the movable flapper comprises
a flow-obstructing plate; and
an outer body attached to the flow-obstructing plate, wherein at least one magnet is encased in the outer body of the movable flapper.
13. The processing chamber of claim 12 , wherein the coupling mechanism is configured to rotate the movable flapper through magnetic interaction.
14. The processing chamber of claim 13 , wherein the valve further comprises a seal cup securely fixed to the valve body, and the outer body of the movable flapper is cylindrical and surrounded by the seal cup.
15. The process chamber of claim 14 , wherein the valve further comprises a bearing interfacing between the outer body and the seal cup.
16. The processing chamber of claim 14 , wherein the coupling mechanism comprises a U-shaped body having magnetized end portions, and the coupling mechanism is positioned outside the seal cup with the magnetized end portions facing two opposite poles of the at least one magnet encased in the outer body.
17. The processing chamber of claim 16 , wherein the valve further comprises an actuator mounted to the valve, the actuator is one of a solenoid, air motor, electric motor, and pneumatic cylinder, and the actuator rotates the coupling mechanism in a controlled manner.