Apparatus for treating surfaces of wafer-shaped articles
An apparatus for processing wafer-shaped articles, comprises a closed process chamber providing a gas-tight enclosure. A rotary chuck is located within the closed process chamber, and is adapted to hold a wafer shaped article thereon. A lid is secured to an upper part of the closed process chamber, and comprises a lower surface facing inwardly of the chamber. At least one heating element heats the lower surface of the lid to a desired temperature, so as to prevent condensation of process vapor on the inwardly facing surface of the lid.
1. An apparatus for processing a wafer, the apparatus comprising:
a closed process chamber comprising a housing, wherein the housing provides a gas-tight enclosure;
a rotary chuck located within the closed process chamber and adapted to hold the wafer; and
a lid secured to an upper part of the closed process chamber, wherein the lid comprises
at least one plate comprising a chemically-resistant plastic and having a lower surface facing inward and at the wafer, wherein the at least one plate comprises an upper plate and a lower plate, and
at least one heating element for heating the lower surface of the at least one plate to a predetermined temperature, wherein the at least one heating element is disposed between the upper plate and the lower plate, and
wherein the rotary chuck is disposed adjacent the lid and between the lid and the wafer.
2. The apparatus according to claim 1 , further comprising an intermediate plate disposed between the upper plate and the at least one heating element.
3. The apparatus according to claim 2 , wherein:
the upper plate comprises slots; and
the intermediate plate increases stiffness of the lid in an area of the lid opposite the slots.
4. The apparatus according to claim 2 , further comprising a spacer plate disposed between the intermediate plate and the at least one heating element and pressing the at least one heating element against the lower plate.
5. The apparatus according to claim 2 , further comprising an annular spacer, wherein:
the lid comprises a central opening through which a liquid is dispensed into the closed process chamber; and
the annular spacer is disposed between the intermediate plate and the central opening.
6. The apparatus according to claim 1 , wherein:
the at least one heating element comprises a plurality of heating elements;
the lower plate comprises a plurality of channels; and
the plurality of heating elements are disposed respectively in the plurality of channels.
7. An apparatus for processing a wafer, the apparatus comprising:
a closed process chamber comprising a housing, wherein the housing provides a gas-tight enclosure;
a rotary chuck located within the closed process chamber and adapted to hold the wafer; and
a lid secured to an upper part of the closed process chamber, wherein the lid comprises
at least one plate comprising a chemically-resistant plastic and having a lower surface facing inward and at the wafer, and
at least one heating element for heating the lower surface of the at least one plate to a predetermined temperature, wherein the at least one heating element is implemented as an electric heating layer of the lid, wherein the electric heating layer comprises silicone rubber, and
wherein the rotary chuck is disposed adjacent the lid and between the lid and the wafer.