IP Library Granted Patent US 8,890,093
Granted Patent B2
US 8,890,093 · App. 14/217,990 · Granted Nov 18, 2014

Charged particle beam apparatus and method for forming observation image

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Quick Facts
Patent No.
US 8,890,093
App. No.
14/217,990
Granted
Nov 18, 2014
Kind
B2
Abstract

A focused ion beam apparatus includes a lens interferometer configured to detect a relative position of an ion beam column and a sample. An image forming section includes an irradiation position specifying section configured to specify an irradiation position of an ion beam based on the detected relative position of the ion beam column and the sample, and a luminance setting section configured to set luminance of a pixel of an observation image based on the specified irradiation position of the ion beam and a detected amount of secondary particles.

Claims (28)

1. A charged particle beam apparatus comprising:

a charged particle beam column configured to irradiate a surface of a sample with a charged particle beam;

a detector configured to detect the amount of secondary particles emitted from the surface of the sample by the irradiation of the charged particle beam; and

an image forming section configured to form an observation image of the surface of the sample based on the detected amount of the secondary particles,

wherein the charged particle beam column is configured to irradiate the surface of the sample corresponding to a unit area of the observation image with the charged particle beam,

wherein the charged particle beam apparatus further comprises a relative position detection unit configured to detect a relative position of the charged particle beam column and the sample, and

wherein the image forming section is configured to:

specify an irradiation position of the charged particle beam based on the detected relative position of the charged particle beam column and the sample; and

set luminance of the unit area of the observation image based on the specified irradiation position of the charged particle beam and the detected amount of the secondary particles.

2. The charged particle beam apparatus according to claim 1 , wherein the image forming section is configured to:

calculate an irradiation ratio to the unit area of the observation image from the specified irradiation position of the charged particle beam;

allocate the amount of the secondary particles to the unit area of the observation image based on the calculated irradiation ratio and the detected amount of the secondary particles; and

set the luminance of the unit area of the observation image based on the amount of the secondary particles allocated to the unit area of the observation image.

3. The charged particle beam apparatus according to claim 2 , wherein the image forming section is configured to set the luminance of the unit area of the observation image based on an average value of the amount of the secondary particles allocated to the unit area of the observation image.

4. A method for forming an observation image, comprising:

a charged particle beam irradiation process of irradiating a surface of a sample with a charged particle beam;

a secondary particle amount detection process of detecting the amount of secondary particles emitted from the surface of the sample by the irradiation of the charged particle beam; and

an image forming process of forming an observation image of the surface of the sample based on the detected amount of the secondary particles,

wherein the charged particle beam irradiation process includes irradiating the surface of the sample corresponding to a unit area of the observation image with the charged particle beam, and

wherein the image forming process comprises:

detecting a relative position of the charged particle beam and the sample;

specifying an irradiation position of the charged particle beam based on the detected relative position; and

setting luminance of the unit area of the observation image based on the specified irradiation position of the charged particle beam and the detected amount of the secondary particles.

5. The method for forming the observation image according to claim 4 , wherein the image forming process further comprises:

calculating an irradiation ratio to the unit area of the observation image from the specified irradiation position of the charged particle beam;

allocating the amount of the secondary particles to the unit area of the observation image based on the calculated irradiation ratio and the detected amount of the secondary particles; and

setting the luminance of the unit area of the observation image based on the amount of the secondary particles allocated to the unit area of the observation image.

6. The method for forming the observation image according to claim 5 , wherein the image forming process further comprises setting the luminance of the unit area of the observation image based on an average value of the amount of the secondary particles allocated to the unit area of the observation image.

Assignments (3)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 20, 2014
From: KOZAKAI, TOMOKAZU; ARAMAKI, FUMIO; MATSUDA, OSAMU
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 032487/0085 →