Fuse element programming circuit and method
In one embodiment, a programming circuit is configured to form a programming current for a silicide fuse element by using a non-silicide programming element.
1. A circuit for programming a fuse element comprising:
a memory cell having the fuse element that includes a first semiconductor material body region and a silicide layer;
a programming circuit configured to form a programming current to program the fuse element; and
a programming element configured to control a value of the programming current, the programming element having a second semiconductor material body region but not a silicide layer;
the programming circuit configured to control the programming current to a first value responsively to a value of the fuse element and to subsequently control the programming current to a different value responsively to a value of the programming element.
2. The circuit of claim 1 wherein a resistivity of the programming element is substantially representative of a resistivity of the first semiconductor material body region of the fuse element.
3. The circuit of claim 1 wherein the programming element includes a doped polysilicon body region that is substantially devoid of a silicide material.
4. The circuit of claim 1 wherein the programming circuit includes a means for forming a value of the programming current to cause electro-migration of silicide material overlying a portion of the first semiconductor material body region of the fuse element and increasing a resistivity of the fuse element.
5. The circuit of claim 1 wherein the programming element includes a plurality of coupled sections wherein each section of the plurality of sections is substantially equal.
6. The circuit of claim 1 wherein the first and second semiconductor material body regions includes first and second polysilicon body regions.
7. The circuit of claim 1 wherein a resistivity of the programming element is substantially representative of a resistivity of the first semiconductor material body region of the fuse element prior to alloying the silicide layer with the first material semiconductor body region.
8. A method of forming a programming circuit for a fuse element comprising:
forming the fuse element having a first semiconductor layer and a silicide layer wherein the first semiconductor layer has a first resistivity and the silicide layer has a second resistivity; and
configuring the programming circuit to control a value of a programming current through the fuse element using a programming element having a third resistivity that is substantially the first resistivity;
configuring the programming circuit to form the programming current with a value to increase the first resistivity to a fourth resistivity and to decrease the programming current to a second value responsively to forming the fourth resistivity wherein the second value is greater than zero.
9. The method of claim 8 further including forming the programming element to include a second semiconductor layer wherein the programming element is substantially devoid of a silicide layer.
10. The method of claim 8 wherein configuring the programming circuit to control the value of the programming current includes configuring a control circuit to form the programming current to cause substantially a void in the silicide layer but not in the first semiconductor layer.
11. The method of claim 10 further including configuring the control circuit to form the programming current to increase the first resistivity to a fourth resistivity and substantially not form a void in the first semiconductor layer.