Photolithographic methods
View Patent ↗Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
1. A method of forming an electronic device, comprising:
(a) providing a semiconductor substrate comprising one or more layers to be patterned;
(b) forming a photoresist layer over the one or more layers to be patterned;
(c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a basic quencher, a polymer and an organic solvent;
(d) exposing the layer to actinic radiation; and
(e) developing the exposed film with an organic solvent developer.
2. The method of claim 1 , wherein the organic solvent developer comprises 2-heptanone.
3. The method of claim 1 , wherein the organic solvent developer comprises n-butyl acetate.
4. The method of claim 1 , wherein the organic solvent developer comprises n-butyl propionate.
5. The method of claim 1 , wherein the organic solvent of the photoresist overcoat composition comprises an alkyl butyrate.
6. The method of claim 5 , wherein the organic solvent of the photoresist overcoat composition comprises a C 8 -C 9 alkyl butyrate.
7. The method of claim 1 , wherein the organic solvent of the photoresist overcoat composition comprises an alkyl propionate.
8. The method of claim 7 , wherein the organic solvent of the photoresist overcoat composition comprises a C 8 -C 9 alkyl propionate.
9. The method of claim 1 , wherein the organic solvent of the photoresist overcoat composition comprises a ketone.
10. The method of claim 9 , wherein the solvent comprises a C 8 -C 9 branched ketone.
11. The method of claim 1 , wherein the photoresist overcoat composition comprises a plurality of polymers.