IP Library Granted Patent US 9,291,574
Granted Patent B2
US 9,291,574 · App. 14/232,929 · Granted Mar 22, 2016

Defect inspection method and defect inspection device

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Quick Facts
Patent No.
US 9,291,574
App. No.
14/232,929
Granted
Mar 22, 2016
Kind
B2
Abstract

A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a table, with illumination light from an inclined direction to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through oval shaped lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light.

Claims (30)

1. A defect inspection method, comprising:

irradiating a linear region on a surface-patterned sample mounted on a table which moves in a plane, with illumination light from an inclined direction relative to a direction of a line normal to the sample;

detecting in each of a plurality of directions an image of scattered light originating from the sample irradiated with the illumination light; and

detecting a defect on the sample by processing signals obtained by the detection of the images of the scattered light;

wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.

2. The defect inspection method according to claim 1 , wherein, in one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the image detection of the scattered light from the plurality of directions is conducted in a plurality of symmetrical directions relative to the normal line.

3. The defect inspection method according to claim 1 , wherein the image detection of the scattered light from the plurality of directions is conducted in a plurality of directions including a direction of the line normal to the surface on which the sample is mounted.

4. The defect inspection method according to claim 1 , further comprising:

detecting the images of the sample-scattered light from the plurality of directions by calibrating a degree of matching in quality of each of the images, in response to a temperature environment and atmospheric pressure environment of a position at which the sample is inspected.

5. The defect inspection method according to claim 4 , wherein the degree of matching in quality of each of the images is calibrated by controlling a spacing between an imaging lens used to form the images of the scattered light, and image sensors that detect the scattered-light images formed by the imaging lens.

6. The defect inspection method according to claim 4 , wherein the degree of matching in quality of each of the images is calibrated by moving at least one of a plurality of lenses of a lens system that form the images of the scattered light, in relative fashion with respect to an optical-axis direction of the lens system.

7. The defect inspection method according to claim 4 , wherein the degree of matching in quality of each of the images is calibrated by shifting a wavelength of the illumination light.

8. A defect inspection device, comprising:

a table unit adapted to move in a plane with a surface-patterned sample mounted on the table unit;

an illumination optics unit that irradiates a linear region on the sample mounted on the table unit, with illumination light from an inclined direction relative to a direction of a line normal to the patterned surface of the sample;

a detection optics unit that detects an image of scattered light originating from the sample irradiated with the illumination light by the illumination optics unit; and

an image-processing unit that detects a defect on the sample by processing a signal obtained from the image of the scattered light that the detection optics unit has detected;

wherein the detection optics unit includes a plurality of detection optical systems arranged so that elliptical lenses in which elevation angles of the optical axes thereof are different from each other are arranged within one plane perpendicular to a plane formed by the normal to the surface of the table unit on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light by the illumination optics unit, the detection optical systems each including an objective lens that is the elliptical lenses formed of circular lenses having left and right portions thereof cut.

9. The defect inspection device according to claim 8 , wherein the plurality of detection optics systems in the detection optics unit are arranged symmetrically with respect to the line normal to that surface of the table unit where the sample is mounted, within one plane perpendicular to a plane formed by the normal to the surface of the table unit on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light by the illumination optics unit.

10. The defect inspection device according to claim 8 , wherein one of the plurality of detection optical systems in the detection optics unit is disposed along the line normal to that surface of the table unit where the sample is mounted.

11. The defect inspection device according to claim 8 , wherein the detection optics unit includes an image quality calibrating mechanism for calibrating, in response to a temperature environment and atmospheric pressure environment of an inspection position, a degree of matching in quality of each of the sample-scattered light images detected by the plurality of detection optical systems.

12. The defect inspection device according to claim 11 , wherein:

the plurality of detection optical systems in the detection optics unit each include an imaging lens and an image sensor; and

the image quality calibrating mechanism is a mechanism that moves the image sensor in relative fashion with respect to an optical-axis direction of the imaging lens.

13. The defect inspection device according to claim 11 , wherein:

the plurality of detection optical systems in the detection optics unit each include a lens system formed from a combination of a plurality of lenses, and an image sensor; and

the image quality calibrating mechanism is a mechanism that moves at least one of the plurality of lenses of the lens system in relative fashion with respect to an optical-axis direction of the lens system.

14. The defect inspection device according to claim 11 , wherein:

the plurality of detection optical systems in the detection optics unit each include a lens system formed from a combination of a plurality of lenses, and an image sensor; and

the image quality calibrating mechanism is a mechanism that shifts a light source wavelength of the illumination optics system.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2014
From: MATSUMOTO, SHUNICHI; TANIGUCHI, ATSUSHI; HONDA, TOSHIFUMI; SHIBATA, YUKIHIRO; URANO, YUTA
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 032969/0352 →