Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications
View Patent ↗A MTJ for a spintronic device that is a domain wall motion device is disclosed and includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/X) n or (CoX) n composition where n is from 2 to 30, X is one of V, Rh, Ir, Os, Ru, Au, Cr, Mo, Cu, Ti, Re, Mg, or Si, and CoX is a disordered alloy. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof with a thickness from 10 to 100 Angstroms. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. The laminated layer may be used as a reference layer, dipole layer, or free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.
1. A domain wall motion device, comprising:
(a) a first stack comprising a lower seed layer and a laminated layer formed thereon wherein the first stack has a first width and wherein the seed layer is one or more of Hf, NiCr, and NiFeCr, and the laminated layer has intrinsic PMA and a composition represented by (Co/X) n or (CoX) n structure wherein X is one of V, Rh, Ir, Os, Ru, Au, Cr, Mo, Cu, Ti, Re, Mg, and Si, CoX is a disordered alloy, and n is the number of laminates in the stack; and
(b) a second stack with a tunnel barrier/free layer/capping layer configuration and having a second width substantially greater than the first width, the tunnel barrier contacts a top surface of the first stack.
2. The domain wall motion device of claim 1 wherein the seed layer consists of Hf, NiCr, NiFeCr, Hf/NiCr, Hf/NiFeCr, NiCr/Hf, or NiFeCr/Hf.
3. The domain wall motion device of claim 1 further comprised of a magnetic layer made of CoFeB, CoFe, or combinations thereof that is formed between the laminated layer and the tunnel barrier layer, the magnetic layer has PMA with a magnetization in the same direction as the PMA in the laminated layer.
4. The domain wall motion device of claim 1 wherein n is from 2 to 30.
5. The domain wall motion device of claim 1 wherein the free layer is part of a wire in an array of wires that is used to store digital information.
6. The domain wall motion device of claim 1 wherein each of the plurality of Co layers in the (Co/X) n layer has a thickness from about 1.5 to 4 Angstroms, and each of the plurality of X layers has a thickness from about 4 to 10 Angstroms.