IP Library › Granted Patent US 9,165,916
Granted Patent B2
US 9,165,916 · App. 14/326,631 · Granted Oct 20, 2015

Semiconductor package and method of fabricating the same

Inventors: Hyunsoo Chung (Hwaseong-si, KR); Seungduk Baek (Hwaseong-si, KR); In-Young Lee (Yongin-si, KR); Tae-Je Cho (Hwaseong-si, KR)
Assignee: Samsung Electronics Co., Ltd.
H01L25/50H01L21/563H01L23/295H01L23/3135H01L23/481H01L24/94H01L24/97H01L25/0657H01L23/3128H01L24/05H01L24/06H01L24/13H01L24/16H01L24/32H01L24/73H01L24/81H01L24/83H01L24/92H01L2224/0401H01L2224/0557H01L2224/06181H01L2224/131H01L2224/16146H01L2224/16225H01L2224/32145H01L2224/32225H01L2224/73104H01L2224/73204H01L2224/81005H01L2224/81815H01L2224/83191H01L2224/83192H01L2224/92125H01L2224/94H01L2224/97H01L2225/06513H01L2225/06517H01L2225/06541H01L2225/06565H01L2924/15311
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,165,916
App. No.
14/326,631
Granted
Oct 20, 2015
Kind
B2
Abstract

A semiconductor package and a method of fabricating the same. The method may include mounting a lower stack including a plurality of lower semiconductor chips on a substrate and mounting an upper stack including a plurality of upper semiconductor chips on the lower stack. According to example embodiments of the inventive concept, the semiconductor package can be easily fabricated.

Claims (31)

1. A method of fabricating a semiconductor package, comprising:

stacking a plurality of lower semiconductor chips to form a lower stack;

mounting the lower stack on a substrate;

forming a lower mold layer on the substrate to enclose a side surface of the lower stack and to expose a top surface of the lower stack;

mounting an upper stack including a plurality of upper semiconductor chips on the lower stack having the side surface enclosed by the lower mold layer; wherein the mounting of the lower stack comprises providing lower solder balls on a bottom surface of the lower stack and performing a reflow process to a structure with the lower solder balls to form lower connecting portions that are disposed between the substrate and the lower stack and are electrically connected to the substrate; and wherein the forming of the lower stack comprises preparing a first semiconductor substrate, on which a first semiconductor chip formed with first through vias is provided; mounting a second semiconductor chip with second through vias, on the first semiconductor chip of the first semiconductor substrate; and performing a separation process to the first semiconductor substrate to form the lower stack including the first and second semiconductor chips that are sequentially stacked.

2. The method of claim 1 , wherein the mounting of the upper stack comprises:

providing upper solder balls on a bottom surface of the upper stack; and

performing a reflow process to a structure with the upper solder balls to form upper connecting portions between the upper stack and the lower stack.

3. The method of claim 1 , wherein the lower mold layer is formed to fill gap regions between the substrate and the lower stack and between the lower semiconductor chips.

4. The method of claim 1 , further comprising forming an upper mold layer to cover the lower mold layer, the lower stack, and the upper stack.

5. The method of claim 4 , wherein the upper mold layer is formed to fill gap regions between the lower and upper stack and between the upper semiconductor chips.

6. The method of claim 4 , wherein the upper mold layer comprises a different material from the lower mold layer.

7. The method of claim 1 , wherein the lower mold layer is formed in such a way that an uppermost surface thereof is coplanar with or lower than a top surface of the lower stack.

8. The method of claim 1 , wherein the upper stack comprises third and fourth semiconductor chips that are sequentially stacked, and the third semiconductor chip comprises third through vias penetrating the third semiconductor chip.

9. A method of fabricating a semiconductor package, comprising:

forming a first mold layer between a substrate and a first stack of semiconductor chips mounted thereon and along sides of the first stack such that a top surface of the first stack is exposed to mount a second stack of semiconductor chips thereon;

forming a second mold layer underneath and along sides of the mounted second stack such that a top surface of the second stack is exposed to mount another semiconductor chip stack,

wherein mounting of the first stack on the substrate comprises:

providing lower solder balls on a bottom surface of the first stack; and

performing a reflow process to the lower solder balls to form lower connecting portions that are disposed between the substrate and the first stack and are electrically connected to the substrate; and wherein the forming of the first stack comprises preparing a first semiconductor substrate, on which a first semiconductor chip formed with first through vias is provided; mounting a second semiconductor chip with second through vias, on the first semiconductor chip of the first semiconductor substrate; and performing a separation process to the first semiconductor substrate to form the lower stack including the first and second semiconductor chips that are sequentially stacked.

10. The method of claim 9 , wherein mounting of the second stack comprises:

providing upper solder balls on a bottom of the second stack; and

performing a reflow process on the upper solder balls to form upper connecting portions between the second stack and the first stack.

11. The method of claim 9 , wherein second mold layer covers the first mold layer, the first stack, and the second stack.

12. The method of claim 9 , wherein the first mold layer comprise a different material from the second mold layer.

13. A method of fabricating a semiconductor package, comprising:

forming a first mold layer between a substrate and a first stack of semiconductor chips mounted thereon and along sides of the first stack such that a top surface of the first stack is exposed to mount a second stack of semiconductor chips;

forming a second mold layer underneath and along sides of the mounted second stack such that a top surface of the second stack is exposed to mount another semiconductor chip stack,

wherein mounting of the second stack comprises:

providing upper solder balls on a bottom of the second stack; and

performing a reflow process on the upper solder balls to form upper connecting portions between the second stack and the first stack; and wherein the forming of the first stack comprises preparing a first semiconductor substrate, on which a first semiconductor chip formed with first through vias is provided; mounting a second semiconductor chip with second through vias, on the first semiconductor chip of the first semiconductor substrate; and performing a separation process to the first semiconductor substrate to form the lower stack including the first and second semiconductor chips that are sequentially stacked.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 9, 2014
From: CHUNG, HYUNSOO; BAEK, SEUNGDUK; LEE, IN-YOUNG; CHO, TAE-JE
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 033270/0213 →
Priority Claims (1)
KR 10-2013-0123444 · Oct 16, 2013 · national
Continuity (1)
Related Publication 20150102505A1 · Apr 16, 2015