Wiring substrate, method of manufacturing wiring substrate, component-embedded glass substrate, and method of manufacturing component-embedded glass substrate
A method of manufacturing a wiring substrate that has a wiring including a through glass via and is formed of a glass substrate includes forming an alteration layer that penetrates the wiring substrate and is patterned, forming the wiring on a front surface of the wiring substrate in which the alteration layer has been formed, and filling an electrode material in a hole formed by removing the alteration layer, thereby forming the through glass via that connects the wiring on the front surface of the wiring substrate and the wiring on a back surface side thereof.
1. A method of manufacturing a wiring substrate, comprising:
forming an alteration layer in the wiring substrate, wherein the wiring substrate is a single continuous layer that extends from a front surface of the wiring substrate to a back surface of the wiring substrate, wherein the alteration layer is patterned within the wiring substrate such that the alteration layer extends through the continuous single layer from the front surface of the wiring substrate to the back surface of the wiring substrate, and wherein the wiring substrate comprises a glass substrate;
forming a first wiring on the front surface of the wiring substrate;
removing at least a portion of the alteration layer to form a through glass via in the glass substrate, wherein the through glass via does not extend through an additional wiring substrate; and
filling an electrode material within the through glass via, wherein the electrode material connects the first wiring on the front surface of the wiring substrate to a second wiring on the back surface of the wiring substrate.
2. The method of manufacturing a wiring substrate according to claim 1 , wherein
the glass substrate is formed of photosensitive glass in which the patterned alteration layer is formed by exposure to a light source and a heat treatment through a mask.
3. The method of manufacturing a wiring substrate according to claim 1 , wherein
the glass substrate is formed of non-photosensitive glass, and by exposure and a heat treatment through a mask, the patterned alteration layer is formed therein.
4. The method of manufacturing a wiring substrate according to claim 1 , wherein
the patterned alteration layer is formed by collected laser pulse irradiation.
5. The method of manufacturing a wiring substrate according to claim 1 , wherein
the patterned alteration layer is removed by using a chemical having selectivity with the glass substrate, and the through glass via extends from the front surface of the wiring substrate to the back surface of the wiring substrate.
6. The method of manufacturing a wiring substrate according to claim 1 , wherein
the wiring substrate further comprises an active element, and
the active element is formed prior to the electrode material being filled within the through glass via.
7. The method of manufacturing a wiring substrate according to claim 6 , wherein
a difference between a thermal expansion coefficient of the patterned alteration layer and a thermal expansion coefficient of a non-alteration layer other than the alteration layer is smaller than approximately 5 ppm/° C.
8. A wiring substrate manufactured by the method of manufacturing a wiring substrate according to claim 1 .