Sintered compact magnesium oxide target for sputtering, and method for producing same
View Patent ↗A sintered compact magnesium oxide target for sputtering having a purity of 99.99 wt % or higher excluding C, a density of 3.57 g/cm 3 or higher, and a whiteness of 60% or less. In order to uniformly deposit a magnesium oxide film, a magnesium oxide target having a higher purity and a higher density is being demanded. An object of this invention is to provide a target capable of realizing the above, and a method for producing such a target. While a magnesium oxide sintered compact sputtering target is produced by hot-pressing a raw material powder, there is a problem in that color shading occurs in roughly φ60 (within a circle having a diameter of 60 mm) at the center part of the target. Conventionally, no particularly attention was given to this problem. However, in recent years, it has become necessary to investigate and resolve this problem in order to improve the deposition quality.
1. A sputtering target comprising a sintered compact of magnesium oxide having a purity of 99.99 wt % or higher excluding C, a density of 3.57 g/cm 3 or higher, and a whiteness of 60% or less.
2. The sputtering target according to claim 1 , wherein the sintered compact of magnesium oxide is produced by sintering a raw material powder obtained by mixing a magnesium oxide (MgO) powder with a magnesium carbonate (MgCO 3 ) powder of an amount of 5 wt % or more and less than 30 wt %.
3. The sputtering target according to claim 2 , wherein the whiteness is 55% or higher and 60% or less.
4. The sputtering target according to claim 3 , wherein the whiteness has a variation within 5%.
5. The sputtering target according to claim 1 , wherein the whiteness is 55% or higher and 60% or less.
6. The sputtering target according to claim 1 , wherein in the whiteness has a variation within 5%.