Lead frame and semiconductor package manufactured by using the same
The present invention provides a lead frame having excellent solder wettability and solderability, that is well-bonded to a copper wire, and manufactured with low cost, and a semiconductor package manufactured by using the same. The lead frame includes: a base material; a first metal layer formed on at least one surface of the base material, the first metal layer comprising nickel; a second metal layer formed on a surface of the first metal layer, the second metal layer comprising palladium; and a third metal layer formed on a surface of the second metal layer, the third metal layer comprising silver.
1. A lead frame comprising:
a base material;
a first metal layer formed on at least one surface of the base material, the first metal layer comprising nickel;
a second metal layer formed on a surface of the first metal layer, the second metal layer comprising palladium; and
a third metal layer formed on a surface of the second metal layer, the third metal layer comprising silver,
wherein palladium is diffused into the third metal layer from the second metal layer, and
wherein a thickness of the third metal layer is thinner than that of the second metal layer.
2. The lead frame of claim 1 , wherein the third metal layer comprises a silver-palladium alloy.
3. The lead frame of claim 1 , wherein a surface of the base material is modified to be rough.
4. The lead frame of claim 1 , further comprising a modified layer of which a surface is modified to be rough between the base material and the first metal layer.
5. The lead frame of claim 1 , wherein the first metal layer comprises a nickel alloy.
6. The lead frame of claim 1 , wherein the second metal layer comprises a palladium alloy.
7. The lead frame of claim 6 , wherein the second metal layer is composed of the palladium alloy and at least one of nickel (Ni), copper (Cu), cobalt (Co), molybdenum (Mo), ruthenium (Ru), tin (Sn), and indium (In).
8. The lead frame of claim 1 , further comprising an organic film layer formed on a surface of the outermost metal layer.
9. The lead frame of claim 1 , wherein at least one of gold (Au), nickel (Ni), copper (Cu), cobalt (Co), molybdenum (Mo), ruthenium (Ru), tin (Sn), and indium (In) is added to the silver-palladium alloy.
10. A semiconductor package comprising:
a lead frame comprising a base material comprising a die pad and a lead part, a first metal layer formed on at least one surface of the base material, the first metal layer comprising nickel, a second metal layer formed on a surface of the first metal layer, the second metal layer comprising palladium, a third metal layer formed on a surface of the second metal layer, the third metal layer comprising silver, and a fourth metal layer formed on a surface of the third metal layer, the fourth metal layer comprising a silver-palladium alloy;
a semiconductor chip bonded to the die pad; and
a plurality of bonding wires connecting the semiconductor chip to the lead part,
wherein palladium is diffused into the third metal layer from the second metal layer.
11. The semiconductor package of claim 10 , wherein the palladium content of the silver-palladium alloy of the fourth metal layer is about 5 to about 50 atomic % or about 4.4 to about 46 weight %.
12. A semiconductor package comprising:
a lead frame comprising a base material comprising a die pad and a lead part, a first metal layer formed on at least one surface of the base material, the first metal layer comprising nickel, a second metal layer formed on a surface of the first metal layer, the second metal layer comprising palladium, and a third metal layer formed on a surface of the second metal layer, the third metal layer comprising silver and the palladium diffused from the second metal layer;
a semiconductor chip bonded to the die pad; and
a plurality of bonding wires connecting the semiconductor chip to the lead part,
wherein a thickness of the third metal layer is thinner than that of the second metal layer.
13. The semiconductor package of claim 11 , wherein the third metal layer comprises a silver-palladium alloy and the palladium diffused from the second metal layer.
14. The lead frame of claim 1 , wherein the thickness of the third metal layer is less than 0.05 μm.
15. A lead frame comprising:
a base material;
a first metal layer formed on at least one surface of the base material, the first metal layer comprising nickel;
a second metal layer formed on a surface of the first metal layer, the second metal layer comprising palladium;
a third metal layer formed on a surface of the second metal layer, the third metal layer comprising silver; and
a fourth metal layer formed on a surface of the third metal layer, the fourth metal layer comprising a silver-palladium alloy,
wherein palladium is diffused into the third metal layer from the second metal layer.
16. The lead frame of claim 15 , wherein a thickness of the third metal layer is thicker than that of the second metal layer.
17. The lead frame of claim 15 , wherein the palladium content of the silver-palladium alloy of the fourth metal layer is about 5 to about 50 atomic % or about 4.4 to about 46 weight %.