IP Library Granted Patent US 9,583,665
Granted Patent B2
US 9,583,665 · App. 14/476,957 · Granted Feb 28, 2017

PIN diode with nanoclusters

Inventor: Srivatsa G. Kundalgurki (Austin, TX)
Assignee: NXP USA, Inc.
H01L31/115G01T3/08H01L31/02161H01L31/02327H01L31/105Y02P70/521
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Quick Facts
Patent No.
US 9,583,665
App. No.
14/476,957
Granted
Feb 28, 2017
Kind
B2
Abstract

A diode for detecting the presence of radiation includes a P region, an N region, an intrinsic region located between the P region and the N region, and a layer of nanoclusters located adjacent to the intrinsic region.

Claims (43)

1. A diode for detecting the presence of radiation comprising:

a P region;

an N region;

an intrinsic region located between the P region and the N region;

a layer of nanoclusters located adjacent to the intrinsic region, wherein the nanoclusters are doped with a material that generates alpha particles upon interactions with neutrons.

2. The diode of claim 1 further comprising:

a dielectric layer located between the layer of nanoclusters and the intrinsic region.

3. The diode of claim 1 wherein the nanoclusters are characterized as silicon nanocrystals.

4. The diode of claim 1 wherein the material includes 10 B isotope.

5. The diode of claim 1 wherein the intrinsic region is characterized as monocrystalline silicon.

6. The diode of claim 1 wherein the nanoclusters have an average height in the range of 10-30 nm.

7. The diode of claim 1 wherein the nanoclusters have an average spacing in the range of 10-30 nm.

8. The diode of claim 1 wherein the P region is located in a substrate, the N region is located in the substrate, the intrinsic region is located in the substrate between the P region and the N region, and the layer of nanoclusters is located over the intrinsic region.

9. The diode of claim 1 further comprising a visible light blocking structure, the layer of nanoclusters is located between the intrinsic region and the visible light blocking structure.

10. The diode of claim 9 further comprising:

a first electrode in ohmic contact with the P region;

a second electrode in ohmic contact with the N region;

wherein the first electrode and the second electrode each include a conductive structure, the conductive structure of the first electrode, the conductive structure of the second electrode, and the blocking structure are predominately made of a first material.

11. The diode of claim 10 wherein the first material is at least 90% aluminum by weight percent.

12. The diode of claim 1 wherein the nanoclusters are of a material, dimension, and spacing that causes at least one of the group consisting of photons and charged particles to change direction upon leaving the layer of nanoclusters.

13. A device for detecting radiation, the device comprising:

a diode, the diode comprising:

a P region;

an N region;

an intrinsic region located between the P region and the N region;

a layer of nanoclusters located adjacent to the intrinsic region;

a measuring circuit having a first terminal electrically coupled to P region and a second terminal coupled to the N region, the measuring circuit configured to provide an indication of the presence of radiation induced electrons in the intrinsic region.

14. The device of claim 13 wherein the measuring circuit is configured to detect the presence of radiation induced electrons in the intrinsic region by measuring a current flowing through the intrinsic region.

15. The device of claim 13 wherein the nanoclusters are doped with a material that generates alpha particles upon interactions with neutrons.

16. The device of claim 15 further comprising:

a second diode comprising:

a second P region;

a second N region;

a second intrinsic region located between the second P region and the second N region;

a second layer of nanoclusters located adjacent to the second intrinsic region, wherein the second layer of nanoclusters is substantially free of the material that generates alpha particles upon interactions with neutrons.

17. A diode comprising:

a P region of a diode in a substrate;

an N region of the diode in the substrate, the N region separated from the P region by an intrinsic region of the diode in the substrate;

a layer of nanoclusters only over the substrate over the intrinsic region, wherein the layer of nanoclusters is in situ doped with a material that generates alpha particles upon interactions with neutrons.

18. The diode of claim 17 further comprising:

a first electrode in ohmic contact with the P region;

a second electrode in ohmic contact with the N region;

a visible light blocking structure over the intrinsic region and over the layer of nanoclusters, a portion of the light blocking structure is in a same lateral plane parallel to the substrate as a portion of the first electrode and a portion of the second electrode.

Assignments (15)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040925 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Feb 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V. F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 052917/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE APPLICATION 11759915 AND REPLACE IT WITH APPLICATION 11759935 PREVIOUSLY RECORDED ON REEL 040928 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE RELEASE OF SECURITY INTEREST. Recorded Jan 17, 2020
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 052915/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 10, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 050744/0097 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NATURE OF CONVEYANCE PREVIOUSLY RECORDED AT REEL: 040626 FRAME: 0683. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER AND CHANGE OF NAME EFFECTIVE NOVEMBER 7, 2016. Recorded Jan 12, 2017
From: NXP SEMICONDUCTORS USA, INC. (MERGED INTO); FREESCALE SEMICONDUCTOR, INC. (UNDER)
To: NXP USA, INC.
Reel/Frame 041414/0883 →
CHANGE OF NAME Recorded Nov 16, 2016
From: FREESCALE SEMICONDUCTOR INC.
To: NXP USA, INC.
Reel/Frame 040626/0683 →
RELEASE OF SECURITY INTEREST Recorded Nov 7, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP B.V.
Reel/Frame 040928/0001 →
RELEASE OF SECURITY INTEREST Recorded Sep 21, 2016
From: MORGAN STANLEY SENIOR FUNDING, INC.
To: NXP, B.V., F/K/A FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 040925/0001 →
SUPPLEMENT TO THE SECURITY AGREEMENT Recorded Jun 16, 2016
From: FREESCALE SEMICONDUCTOR, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 039138/0001 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 7, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037458/0502 →
ASSIGNMENT AND ASSUMPTION OF SECURITY INTEREST IN PATENTS Recorded Jan 7, 2016
From: CITIBANK, N.A.
To: MORGAN STANLEY SENIOR FUNDING, INC.
Reel/Frame 037458/0460 →
PATENT RELEASE Recorded Dec 21, 2015
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 037357/0921 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034153/0027 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034160/0351 →
SUPPLEMENT TO IP SECURITY AGREEMENT Recorded Nov 4, 2014
From: FREESCALE SEMICONDUCTOR, INC.
To: CITIBANK, N.A., AS NOTES COLLATERAL AGENT
Reel/Frame 034160/0370 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 4, 2014
From: KUNDALGURKI, SRIVATSA G.
To: FREESCALE SEMICONDUCTOR, INC.
Reel/Frame 033670/0907 →
Continuity (1)
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