Resist composition and patterning process
A resist composition comprises a metal compound obtained from reaction of a starting metal compound having formula (A-1) or a (partial) hydrolyzate or condensate or (partial) hydrolytic condensate thereof, with a di- or trihydric alcohol having formula (A-2). M(OR 1A ) 4 (A-1) R 2A (OH) m (A-2) In formula (A-1), M is Ti, Zr or Hf, and R 1A is alkyl. In formula (A-2), m is 2 or 3, R 2A is a divalent group when m=2 or a trivalent group when m=3. The resist composition exhibits improved resolution and edge roughness when processed by the EB or EUV lithography.
1. A resist composition comprising a metal compound obtained from reaction of at least one metal compound selected from the group consisting of a metal compound having the general formula (A-1) and a metal compound obtained from (partial) hydrolysis or condensation, or (partial) hydrolytic condensation of the metal compound of formula (A-1), with a di- or trihydric alcohol having the general formula (A-2),
M(OR 1A ) 4 (A-1)
wherein M is an element selected from the group consisting of titanium, zirconium, and hafnium, and R 1A is a straight or branched C 1 -C 6 alkyl group,
R 2A (OH) m (A-2)
wherein m is 2 or 3, when m is 2, R 2A is a divalent group selected from the group consisting of a straight, branched or cyclic C 2 -C 20 alkylene, alkenylene, alkynylene or aralkylene group, a straight or branched alkylene group substituted with a cyclic alkyl, cyclic alkenyl or aryl moiety, and a straight or branched alkylene group having an intervening cyclic alkylene, cyclic alkenylene or arylene moiety, said divalent group may have a cyano moiety or be separated by a carbonyl, ester, ether, thiol or NR moiety wherein R is hydrogen or a straight or branched C 1 -C 6 alkyl group, and when m is 3, R 2A is a trivalent group corresponding to the divalent group with one hydrogen eliminated.
2. A pattern forming process comprising the steps of coating the resist composition of claim 1 onto a substrate, baking, exposing to high-energy radiation, and developing with a developer.
3. The process of claim 2 wherein the developer is alkaline water.
4. The process of claim 3 wherein the developer is an aqueous solution of at least one hydroxide selected from the group consisting of tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, choline hydroxide, sodium hydroxide, and potassium hydroxide.
5. The process of claim 2 wherein the high-energy radiation is EUV radiation having a wavelength of 3 to 15 nm.
6. The process of claim 2 wherein the high-energy radiation is EB at an accelerating voltage of 1 to 150 keV.