IP Library Granted Patent US 9,478,733
Granted Patent B2
US 9,478,733 · App. 14/529,248 · Granted Oct 25, 2016

Co/Ni multilayers with improved out-of-plane anisotropy for magnetic device applications

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Quick Facts
Patent No.
US 9,478,733
App. No.
14/529,248
Granted
Oct 25, 2016
Kind
B2
Abstract

A MTJ for a spintronic device includes a thin seed layer that enhances perpendicular magnetic anisotropy (PMA) in an overlying laminated layer with a (Co/Ni) n composition or the like where n is from 2 to 30. The seed layer is preferably NiCr, NiFeCr, Hf, or a composite thereof with a thickness from 10 to 100 Angstroms. Furthermore, a magnetic layer such as CoFeB may be formed between the laminated layer and a tunnel barrier layer to serve as a transitional layer between a (111) laminate and (100) MgO tunnel barrier. There may be a Ta insertion layer between the CoFeB layer and laminated layer to promote (100) crystallization in the CoFeB layer. The laminated layer may be used as a free layer in a MTJ. Annealing between 300° C. and 400° C. may be used to further enhance PMA in the laminated layer.

Claims (12)

1. A magnetic tunnel junction (MTJ), comprising:

(a) a seed layer formed on a substrate;

(b) a composite free layer comprising a lower laminated layer that contacts a top surface of the seed layer, the lower laminated layer has intrinsic perpendicular magnetic anisotropy (PMA) and includes two metals, a metal and alloy, or two alloys represented by (A1/A2) n or (A1/C/A2) where A1 is a first magnetic element or alloy, A2 is a second magnetic element or alloy, C is a non-magnetic spacer, and n is the number of laminates in the lower laminated layer, the composite free layer also includes an upper magnetic layer that has PMA with a magnetization in the same direction as the PMA in the lower laminated layer;

(c) a tunnel barrier layer contacting a top surface of the upper magnetic layer;

(d) a reference layer formed on the tunnel barrier layer; and

(e) and a capping layer formed on the reference layer.

2. The MTJ of claim 1 wherein the seed layer is Hf, NiFeCr, or NiCr, or a composite with a Hf/NiCr, Hf/NiFeCr, NiFeCr/Hf, or NiCr/Hf configuration and having a thickness between about 5 and 100 Angstroms.

3. The MTJ of claim 1 wherein the upper magnetic layer is CoFeB, CoFe, or combinations thereof with a thickness from about 6 and 14 Angstroms.

4. The MTJ of claim 3 wherein the upper magnetic layer consists of CoFeB and the composite free layer further comprises a Ta layer about 0.5 to 3 Angstroms thick formed between the lower laminated layer and the upper magnetic layer.

5. The MTJ of claim 1 wherein n is from 2 to 30, A1 is a first metal or alloy selected from one or more of Co, Ni, and Fe that may be doped with boron up to about 50 atomic %, A2 is a second metal or alloy selected from one or more of Co, Fe, Ni, Pt, and Pd, and A1 is unequal to A2.

6. The MTJ of claim 1 wherein C is a Ru layer with a thickness between about 5 and 20 Angstroms.

7. The MTJ of claim 1 wherein the reference layer is comprised of CoFeB, CoFe, or combinations thereof.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2019
From: HEADWAY TECHNOLOGIES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 048692/0917 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2018
From: MAGIC TECHNOLOGIES, INC.
To: HEADWAY TECHNOLOGIES, INC.
Reel/Frame 047604/0081 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 18, 2018
From: JAN, GUENOLE; KULA, WITOLD; TONG, RU YING; WANG, YU JEN
To: MAGIC TECHNOLOGIES, INC.
Reel/Frame 047216/0897 →