Photomask, photomask set, exposure apparatus and exposure method

1. An exposure apparatus for exposing both faces of a substrate wherein both the faces have a photosensitive material formed thereon, the exposure apparatus comprising:

a first moving mechanism comprising a first drive source and moving by driving the first drive source a first photomask disposed to oppose one face of the substrate at a position where exposure is performed;

a second moving mechanism comprising a second drive source and moving by driving the second drive source a second photomask disposed to oppose other face of the substrate at a position where exposure is performed;

an imaging means for imaging a first alignment mark formed on the first photomask and a substrate side mark formed on the substrate and imaging a second alignment mark formed on the first photomask and a third alignment mark formed on the second photomask;

a first pressure generating means for retaining the substrate by the first photomask by utilizing negative pressure or releasing retention of the substrate by the first photomask by utilizing positive pressure;

a second pressure generating means for retaining the substrate by the second photomask by utilizing negative pressure or releasing retention of the substrate by the second photomask by utilizing positive pressure; and

a control unit for controlling driving of the first drive source, the second drive source, the imaging means, the first pressure generating means and the second pressure generating means, wherein

the control unit controls the first drive source so that alignment between the first alignment mark and the substrate side mark is performed based on results of imaging these marks in the imaging means,

the control unit controls driving of the first pressure generating means so as to retain the substrate by the first photomask by utilizing negative pressure after alignment between the substrate and the first photomask is performed by controlling the first drive source,

the control unit controls the second drive source so that alignment between the second alignment mark and the third alignment mark is performed based on results of imaging these marks in the imaging means, and

the control unit controls driving of the second pressure generating means so as to retain the substrate by the second photomask by utilizing negative pressure after alignment between the substrate and the second photomask is performed by controlling the second drive source.

2. An exposure apparatus for exposing both faces of a substrate wherein both the faces have a photosensitive material formed thereon, the exposure apparatus comprising:

a first photomask comprising a drawing pattern for exposure formed on one face, a first alignment mark for alignment with a substrate side mark formed on the substrate, the first alignment mark being provided in a region of the one face, the region opposing the substrate when the substrate is retained and the drawing pattern is not formed in the region, and a second alignment mark provided in a region which does not oppose the substrate when the substrate is retained;

a first moving mechanism comprising a first drive source and moving by driving the first drive source the first photomask disposed to oppose one face of the substrate at a position where exposure is performed;

a second photomask comprising a drawing pattern for exposure formed on one face, a third alignment mark for alignment with the second alignment mark, the third alignment mark being provided in a region of the one face wherein the region does not oppose the substrate when the substrate is retained;

a second moving mechanism comprising a second drive source and moving by driving the second drive source the second photomask disposed to oppose other face of the substrate at a position where exposure is performed;

an imaging means for imaging the first alignment mark and a substrate side mark formed on the substrate and imaging the second alignment mark and the third alignment mark;

a first pressure generating means for retaining the substrate by the first photomask by utilizing negative pressure or releasing retention of the substrate by the first photomask by utilizing positive pressure;

a second pressure generating means for retaining the substrate by the second photomask by utilizing negative pressure or releasing retention of the substrate by the second photomask by utilizing positive pressure; and

a control unit for controlling driving of the first drive source, the second drive source, the imaging means, the first pressure generating means and the second pressure generating means, wherein

the control unit controls the first drive source so that alignment between the first alignment mark and the substrate side mark is performed based on results of imaging these marks in the imaging means,

the control unit controls driving of the first pressure generating means so as to retain the substrate by the first photomask by utilizing negative pressure after alignment between the substrate and the first photomask is performed by controlling the first drive source,

the control unit controls the second drive source so that alignment between the second alignment mark and the third alignment mark is performed based on results of imaging these marks in the imaging means, and

the control unit controls driving of the second pressure generating means so as to retain the substrate by the second photomask by utilizing negative pressure after alignment between the substrate and the second photomask is performed by controlling the second drive source.