Coating compositions suitable for use with an overcoated photoresist
View Patent ↗In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
1. A coated substrate comprising: (a) a coating composition layer comprising a resin, the resin comprising a reaction product of a diene and a dienophile, and wherein the resin comprises a hydroxyl-naphthoic group; and (b) a photoresist layer over the coating composition layer.
2. A substrate of claim 1 wherein the coating composition comprises a resin comprising a 6-hydroxy-2-naphthoic group.
3. The substrate of claim 1 wherein (i) the resin comprising a reaction product or (ii) the component that comprises a hydroxyl-naphthoic group is a terpolymer, tetrapolymer or pentapolymer.
4. The substrate of claim 1 wherein the coating composition layer is not crosslinked.
5. The substrate of claim 1 wherein the coating composition layer is crosslinked.
6. The substrate of claim 1 wherein the coating composition layer resin comprises a reaction product of an imide-containing dienophile and a polycyclic aromatic group.