IP Library Granted Patent US 9,845,533
Granted Patent B2
US 9,845,533 · App. 14/538,769 · Granted Dec 19, 2017

Substrate carrier system utilizing electrostatic chucking to accommodate substrate size heterogeneity

Inventors: Sriskantharajah Thirunavukarasu (Singapore, SG); Karthik Elumalai (Bangalore, IN); Jen Sern Lew (Singapore, SG); Mingwei Zhu (Sunnyvale, CA)
Assignee: APPLIED MATERIALS, INC.
C23C16/4586H01L21/6831H01L21/68771C23C16/303
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Quick Facts
Patent No.
US 9,845,533
App. No.
14/538,769
Granted
Dec 19, 2017
Kind
B2
Abstract

Embodiments of improved substrate carriers are provided herein. In some embodiments, a substrate carrier, includes: a multi-layered disk having upper and lower layers formed of a continuous material and an electrostatic electrode structure disposed therebetween, wherein the multi-layered disk is dimensioned and arranged so as to have a nominal dimension which exceeds a nominal dimension of a standard substrate size used in the manufacture of light emitting diode devices, and wherein the multi-layered disk is formed symmetrically about a central axis and defines a substantially planar upper surface.

Claims (24)

1. A substrate carrier, comprising:

a multi-layered disk having upper and lower layers formed of a continuous material and an electrostatic electrode structure disposed therebetween,

wherein the multi-layered disk is formed symmetrically about a central axis and defines a planar upper surface;

wherein the electrode structure is a bipolar electrode structure comprising an inner electrode having a center portion and a first group of electrostatic chuck elements and an outer electrode surrounding the inner electrode and having a second group of electrostatic chuck elements;

wherein the first group of electrostatic chuck elements comprise finger-like elements extending radially outward from the center portion of the inner electrode;

wherein the second group of electrostatic chuck elements comprise finger-like elements extending radially inward from an outer circumference of the outer electrode; and

wherein respective ones of the finger-like elements of the second group of electrostatic chuck elements are interposed between adjacent ones of the finger-like elements of the first group of electrostatic chuck elements.

2. The substrate carrier of claim 1 , wherein the upper and lower layers comprise aluminum nitride.

3. The substrate carrier of claim 2 , wherein the multi-layered disk has a circular periphery and a nominal diameter, and wherein the nominal diameter is a multiple of at least one of a six-inch, four-inch, three-inch, or two-inch nominal diameter.

4. The substrate carrier of claim 1 , wherein the multi-layered disk further defines a planar lower surface, and wherein a thickness of the multi-layered disk measured between the upper and lower surfaces is from about 0.70 mm to about 2.20 mm.

5. The substrate carrier of claim 1 , wherein the multi-layered disk has a circular periphery and a nominal diameter of 301 mm.

6. The substrate carrier of claim 1 , wherein each of the first and second groups of electrostatic chuck elements are dimensioned and arranged such that at least one electrostatic chuck element of each group is configured to underlie a substrate placed on the upper surface.

7. The substrate carrier of claim 1 , wherein the planar upper surface defined by the multi-layered disk is a polished surface.

8. A substrate carrier, comprising:

an electrostatic chuck structure disposed between upper and lower layers of aluminum nitride,

wherein the upper layer defines a polished, planar upper surface; and

wherein the carrier is dimensioned and arranged so as to have a nominal dimension which is a multiple of at least one of six, four, three, and two inches so as to accommodate placement, on the planar upper surface, of each of:

a first combination of substrates wherein all substrates of the first combination have a common nominal dimension; or

a second combination of substrates wherein at least one substrate of the second combination has a nominal dimension which is different from a nominal dimension of at least one other substrate of the second combination;

wherein the electrostatic chuck structure is a bipolar electrode structure comprising an inner electrode having a center portion and a first group of electrostatic chuck elements and an outer electrode surrounding the inner electrode and having a second groups of electrostatic chuck elements;

wherein the first group of electrostatic chuck elements comprise finger-like elements extending radially outward from the center portion of the inner electrode;

wherein the second group of electrostatic chuck elements comprise finger-like elements extending radially inward from an outer circumference of the outer electrode; and

wherein respective ones of the finger-like elements of the second group of electrostatic chuck elements are interposed between adjacent ones of the finger-like elements of the first group of electrostatic chuck elements.

9. The substrate carrier according to claim 8 , wherein each of the layers and electrode structure has a nominal outer diameter of from 300 to 301 mm.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 1, 2015
From: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
To: APPLIED MATERIALS, INC.
Reel/Frame 035752/0550 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2015
From: ELUMALAI, KARTHIK; ZHU, MINGWEI
To: APPLIED MATERIALS, INC.
Reel/Frame 034846/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 29, 2015
From: THIRUNAVUKARASU, SRISKANTHARAJAH; LEW, JEN SERN
To: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
Reel/Frame 034846/0754 →
Continuity (1)
Related Publication 20160133782A1 · May 12, 2016