IP Library Granted Patent US 9,645,100
Granted Patent B2
US 9,645,100 · App. 14/579,630 · Granted May 9, 2017

X-ray fluorescence analysis apparatus

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,645,100
App. No.
14/579,630
Granted
May 9, 2017
Kind
B2
Abstract

An X-ray fluorescence analysis apparatus is provided with: an excitation source configured to excite an analysis target sample to emit a characteristic X-ray; an X-ray detector configured to detect the characteristic X-ray emitted from the analysis target sample; and an electromagnetic wave shield and a heat shield that are sequentially arranged from the analysis target sample toward the X-ray detector. The electromagnetic wave shield is provided with a through hole portion on which a through hole through which the characteristic X-ray passes is formed, the through hole having a size equal to or smaller than 50 μm. The heat shield is provided with a window portion through which the characteristic X-ray is passed through.

Claims (32)

1. An X-ray fluorescence analysis apparatus comprising:

an excitation source configured to excite an analysis target sample to emit a characteristic X-ray;

an X-ray detector configured to detect the characteristic X-ray emitted from the analysis target sample; and

an electromagnetic wave shield and a heat shield that are sequentially arranged from the analysis target sample toward the X-ray detector,

wherein the electromagnetic wave shield comprises a through hole portion on which a through hole through which the characteristic X-ray passes is formed, the through hole having a size equal to or smaller than 50 μm, and

wherein the heat shield comprises a window portion through which the characteristic X-ray is passed through.

2. The X-ray fluorescence analysis apparatus according to claim 1 ,

wherein the window portion of the heat shield is configured to have a size equal to or smaller than a size of the through hole portion.

3. The X-ray fluorescence analysis apparatus according to claim 2 ,

wherein the heat shield is configured to have one or more of the window portion, and

wherein a size of each window portion is configured to be smaller as a distance from the through hole portion becomes larger and to be smaller than a size of the through hole portion.

4. The X-ray fluorescence analysis apparatus according to claim 1 ,

wherein the through hole is configured to have a size equal to or smaller than 10 μm.

5. The X-ray fluorescence analysis apparatus according to claim 1 ,

wherein the heat shield is configured to have three or less window portions which are sequentially arranged from the electromagnetic wave shield toward the X-ray detector.

6. The X-ray fluorescence analysis apparatus according to claim 5 ,

wherein the heat shield is configured to have two or less window portions which are sequentially arranged from the electromagnetic wave shield toward the X-ray detector.

7. The X-ray fluorescence analysis apparatus according to claim 5 ,

wherein the electromagnetic wave shield is provided with a hole portion to which the through hole portion is equipped, and

wherein the window portion is configured to have a size smaller than a size of the hole portion by 1 mm or more.

8. The X-ray fluorescence analysis apparatus according to claim 5 further comprising:

a cooling device configured to cool a first window portion to a temperature equal to or lower than 10K, the first window portion being the window portion closest to the X-ray detector among a plurality of the window portions is equal to or less than 10 K, and to cool a second a second window portion to a temperature equal to or lower than 100K, the second window portion being the window portion adjacent to the first window portion.

9. The X-ray fluorescence analysis apparatus according to claim 1 ,

wherein the window portion is configured by a laminated body of metal and an organic membrane or a silicon nitride membrane, and the thickness of each of the metal and the organic membrane or the silicon nitride membrane is configured to be equal to or less than 100 nm.

10. The X-ray fluorescence analysis apparatus according to claim 1 ,

wherein the electromagnetic wave shield is configured to concentrate the characteristic X-ray.

11. The X-ray fluorescence analysis apparatus according to claim 1 further comprising:

a shield cooling device configured to cool the electromagnetic wave shield to a temperature equal to or less than 200 K.

12. The X-ray fluorescence analysis apparatus according to claim 1 further comprising:

a shield position adjustment mechanism configured to adjust a position of the electromagnetic wave shield between the analysis target sample and the X-ray detector;

a cooling position adjustment mechanism configured to adjust a cooling position at which the cooling device cools the window portion and the X-ray detector; and

a shut-off valve configured to separate a vacuum space between the shield position adjustment mechanism and the cooling position adjustment mechanism.

Assignments (3)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2014
From: TANAKA, KEIICHI; ODAWARA, AKIKAZU
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 034570/0957 →