Coating compositions for use with an overcoated photoresist
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
1. A coated substrate comprising:
(a) a layer of a coating composition on a substrate, the coating composition comprising a polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups; and
(b) a photoresist layer over the coating composition layer.
2. The substrate of claim 1 wherein the resin further comprises one or more uracil groups.
3. A method of forming a photoresist relief image, comprising:
(a) applying a coating composition on a substrate, the coating composition comprising polyester resin that comprises 1) one or more polymerized parabanic diacetate groups and 2) one or more cyanurate groups;
(b) applying a photoresist composition above the coating composition layer; and
(c) exposing and developing the photoresist layer to provide a resist relief image.
4. The method of claim 3 wherein the coating composition comprises a component that comprises anthracene groups.
5. The method of claim 3 wherein the photoresist is exposed with 193 nm radiation.
6. The method of claim 3 wherein the applied coating composition is crosslinked prior to applying the photoresist composition.
7. The method of claim 3 wherein the coating composition comprises a component that comprises phenyl groups.
8. An antireflective composition for use with an overcoated photoresist composition, the antireflective composition comprising a polyester resin that comprises 1) one or more parabanic acid moieties and 2) one or more polymerized tris(hydroxyl ethyl)isocyanurate groups.
9. The antireflective composition of claim 8 wherein the resin comprises phenyl groups.
10. The antireflective composition of claim 8 wherein the antireflective composition comprises a crosslinker component.
11. The antireflective composition of claim 8 wherein the antireflective composition comprises a component that comprises anthracene groups.
12. The antireflective composition of claim 8 wherein the polyester resin comprises polymerized parabanic diacetate compounds.