Semiconductor device and fabrication method thereof
An MOSFET includes a silicon carbide substrate, an active layer, a gate oxide film, and a gate electrode. The active layer includes a body region where an inversion layer is formed at a region in contact with the gate oxide film by application of voltage to the gate electrode. The body region includes a low concentration region arranged at a region where an inversion layer is formed, and containing impurities of low concentration, and a high concentration region adjacent to the low concentration region in the carrier mobile direction in the inversion layer, arranged in a region where the inversion layer is formed, and containing impurities higher in concentration than in the low concentration region.
1. A method of fabricating a semiconductor device, comprising the steps of:
forming an epitaxial growth layer made of silicon carbide on a silicon carbide substrate of a first conductivity type, said epitaxial growth layer including a drift layer of the first conductivity type, and a body region having a high concentration region of a second conductivity type and a low concentration region of the second conductivity type;
forming a source region of the first conductivity type on said low concentration region to be in contact with said low concentration region;
forming a trench in said epitaxial growth layer to penetrate said low concentration region, said high concentration region, and said source region and reach said drift layer after forming said low concentration region, said high concentration region, and said source region; and
forming a gate electrode on a surface of said trench, with a gate insulation film interposed therebetween.
2. The method of fabricating the semiconductor device according to claim 1 , wherein
an impurity of the second conductivity type is introduced into said epitaxial growth layer such that the impurity of the second conductivity type contained in said high concentration region has a concentration of greater than or equal to 1×10 17 cm′ and less than or equal to 1×10 18 cm −3 , and
the impurity of the second conductivity type is introduced into said epitaxial growth layer such that the impurity of the second conductivity type contained in said low concentration region has a concentration of less than or equal to 2×10 16 cm −3 .
3. The method of fabricating the semiconductor device according to claim 1 , wherein said drift layer of the first conductivity type, said high concentration region of the second conductivity type, and said low concentration region of the second conductivity type are formed by epitaxial growth.
4. The method of fabricating the semiconductor device according to claim 1 , wherein said source region is formed such that a channel length is less than or equal to 0.5 μm.
5. The method of fabricating the semiconductor device according to claim 1 , wherein said drift layer, said high concentration region, said low concentration region, and said source region are formed sequentially.
6. The method of fabricating the semiconductor device according to claim 1 , wherein said gate insulation film is formed by thermally oxidizing the surface of said trench including surfaces of said high concentration region and said low concentration region.
7. The method of fabricating the semiconductor device according to claim 1 , further comprising the step of forming a field alleviation region at a bottom of said trench and forming a contact region at a surface of said epitaxial growth layer by implanting an impurity of the second conductivity type into the bottom of said trench and the surface of said epitaxial growth layer after forming said trench.