Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component
View Patent ↗Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition. Used as the component (A) are acrylate compounds or methacrylate compounds, to be specific, an acrylate compound or a methacrylate compound having an amide group and an acrylate compound or a methacrylate compound containing a urethane bond.
1. A photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group, (B) a photopolymerization initiator, and (C) an inorganic filler,
wherein the photopolymerizable compound (A) having at least one ethylenically unsaturated group comprises an acrylate compound or a methacrylate compound containing a urethane bond, and
the inorganic filler (C) comprises at least one filler selected from the group consisting of silica, alumina, titanium oxide, zirconia, talc, mica, boron nitride, kaolin and barium sulfate, having an average aspect ratio of 30 to 100 and a volume average particle diameter of 5 to 50 μm, and having a tabular form.
2. The photosensitive resin composition according to claim 1 , wherein a tensile elastic modulus after cured is 0.5 GPa or more at 150° C.
3. A photosensitive film prepared by molding the photosensitive resin composition according to claim 1 in a film form.
4. The photosensitive resin composition according to claim 1 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica and mica.
5. The photosensitive resin composition according to claim 1 , wherein the inorganic filler is silica.
6. The photosensitive resin composition according to claim 1 , wherein the inorganic filler is mica.
7. A hollow structure formed on a substrate of an electronic component by a rib material and a cover material, wherein the rib material and/or the cover material comprise a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group, (B) a photopolymerization initiator, and (C) an inorganic filler,
wherein the photopolymerizable compound (A) having at least one ethylenically unsaturated group comprises an acrylate compound or a methacrylate compound containing a urethane bond, and
the inorganic filler (C) comprises a filler having an average aspect ratio of 30 to 100 and a volume average particle diameter of 5 to 50 μm, and having a tabular form.
8. An electronic component having the hollow structure according to claim 7 .
9. The electronic component according to claim 8 , wherein said electronic component is a surface acoustic wave filter.
10. The hollow structure according to claim 7 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica, alumina, titanium oxide, zirconia, talc, mica, boron nitride, kaolin and barium sulfate.
11. The hollow structure according to claim 7 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica and mica.
12. The hollow structure according to claim 7 , wherein the inorganic filler is silica.
13. The hollow structure according to claim 7 , wherein the inorganic filler is mica.
14. A method for forming a rib pattern for forming a hollow structure, comprising:
a photosensitive resin layer laminating step for laminating a photosensitive resin composition on a substrate, to form a photosensitive resin layer, the photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group, (B) a photopolymerization initiator, and (C) an inorganic filler, wherein the photopolymerizable compound (A) having at least one ethylenically unsaturated group comprises an acrylate compound or a methacrylate compound containing a urethane bond, and the inorganic filler (C) comprises a filler having an average aspect ratio of 30 to 100 and a volume average particle diameter of 5 to 50 μm, and having a tabular form,
an exposing step for irradiating a prescribed part of the photosensitive resin layer with an active energy light ray via a mask to photocure the exposed part,
a removing step for removing parts other than the exposed part of the photosensitive resin layer with a developer, and
a thermal curing step for thermally curing the exposed part of the photosensitive resin layer to form a resin cured product.
15. The method for forming a rib pattern for forming a hollow structure according to claim 14 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica, alumina, titanium oxide, zirconia, talc, mica, boron nitride, kaolin and barium sulfate.
16. The method for forming a rib pattern for forming a hollow structure according to claim 14 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica and mica.
17. A method for forming a hollow structure comprising:
a photosensitive resin layer laminating step for laminating a photosensitive resin composition on a rib pattern provided for forming a hollow structure on a substrate so that a cover part of the hollow structure is formed thereon, to form a photosensitive resin layer, the photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group, (B) a photopolymerization intiator, and (C) an inorganic filler, wherein the photopolymerizable compound (A) having at least one ethylenically unsaturated group comprises an acrylate compound or a methacrylate compound containing a urethane bond, and the inorganic filler (C) comprises a filler having an average aspect ratio of 30 to 100 and a volume average particle diameter of 5 to 50 μm, and having a tabular form,
an exposing step for irradiating a prescribed part of the photosensitive resin layer with an active energy light ray via a mask to photocure the exposed part,
a removing step for removing parts other than the exposed part of the photosensitive resin layer with a developer, and
a thermal curing step for thermally curing the exposed part of the photosensitive resin layer to form a resin cured product.
18. The method for forming a hollow structure according to claim 17 , wherein the rib pattern provided for forming a hollow structure on a substrate is formed by a method comprising a photosensitive resin layer laminating step for laminating said photosensitive resin composition on a substrate, to form a photosensitive resin layer, an exposing step for irradiating a prescribed part of the photosensitive resin layer with an active energy light ray via a mask to photocure the exposed part, a removing step for removing parts other than the exposed part of the photosensitive resin layer with a developer and a thermal curing step for thermally curing the exposed part of the photosensitive resin layer to form a resin cured product.
19. The method for forming a hollow structure according to claim 17 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica, alumina, titanium oxide, zirconia, talc, mica, boron nitride, kaolin and barium sulfate.
20. The method for forming a hollow structure according to claim 17 , wherein the inorganic filler (C) comprises at least one filler selected from the group consisting of silica and mica.