Quaternary ammonium salt compound, composition for forming a resist under layer film, and patterning process
A quaternary ammonium salt compound is represented by the following formula (A-1), wherein, R 1 , R 2 , and R 3 each represent an alkyl group, an alkenyl group, an aryl group, or an aralkyl group, a part or all of hydrogen atoms in these groups may be substituted by a hydroxyl group(s), an alkoxy group(s), or a halogen atom(s), and these groups may include one or more of a carbonyl group and an ester bond; R 4 represents a single bond, an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, a part or all of hydrogen atoms in these groups may be substituted by an alkoxy group(s) or a halogen atom(s), and these groups may include one or more of an ether bond, a carbonyl group, an ester bond, and an amide bond; and A − represents a non-nucleophilic counter ion.
1. A quaternary ammonium salt compound represented by the following formula (A-1),
wherein, R 1 , R 2 , and R 3 each represent a linear, branched or cyclic alkyl group or alkenyl group having 1 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an aralkyl group having 7 to 12 carbon atoms, a part or all of hydrogen atoms in these groups may be substituted by a hydroxyl group(s), an alkoxy group(s), or a halogen atom(s), and these groups may include one or more of a carbonyl group and an ester bond; R 4 represents a single bond, a linear, branched or cyclic alkylene group or alkenylene group having 1 to 12 carbon atoms, an arylene group having 6 to 20 carbon atoms, or an aralkylene group having 7 to 12 carbon atoms, a part or all of hydrogen atoms in these groups may be substituted by an alkoxy group(s) or a halogen atom(s), each of these groups of R 4 include an ester bond and may optionally include one or more of an ether bond, a carbonyl group, and an amide bond; and A − represents a non-nucleophilic counter ion.
2. A composition for forming a resist under layer film which comprises the quaternary ammonium salt compound according to claim 1 and a polysiloxane.
3. The composition for forming a resist under layer film according to claim 2 , wherein the polysiloxane includes one or more members selected from a compound represented by the following formula (B-1), a hydrolysate of the compound, a condensate of the compound, and a hydrolysis condensate of the compound,
R 1B B1 R 2B B2 R 3B B3 Si(OR 0B ) (4-B1-B2-B3 ) (B-1)
wherein, R 0B represents a hydrocarbon group having 1 to 6 carbon atoms; R 1B , R 2B , and R 3B each represent a hydrogen atom or a monovalent organic group; and B1, B2, and B3 are each 0 or 1, and satisfy 0≦B1+B2+B3≦3.
4. A patterning process which comprises the steps of:
forming an organic under layer film on a body to be processed by using a coating type organic under layer film material;
forming a resist under layer film on the organic under layer film by using the composition for forming a resist under layer film according to claim 2 ;
forming a resist pattern on the resist under layer film;
transferring the pattern to the resist under layer film by dry etching using the resist pattern as a mask;
transferring the pattern to the organic under layer film by dry etching using the resist under layer film to which the pattern has been transferred as a mask; and further
transferring the pattern to the body to be processed by dry etching using the organic under layer film to which the pattern has been transferred as a mask.
5. A patterning process which comprises the steps of:
forming an organic under layer film on a body to be processed by using a coating type organic under layer film material;
forming a resist under layer film on the organic under layer film by using the composition for forming a resist under layer film according to claim 3 ;
forming a resist pattern on the resist under layer film;
transferring the pattern to the resist under layer film by dry etching using the resist pattern as a mask;
transferring the pattern to the organic under layer film by dry etching using the resist under layer film to which the pattern has been transferred as a mask; and further
transferring the pattern to the body to be processed by dry etching using the organic under layer film to which the pattern has been transferred as a mask.
6. The patterning process according to claim 4 , wherein the coating type organic under layer film material contains an anthracene skeleton.
7. The patterning process according to claim 5 , wherein the coating type organic under layer film material contains an anthracene skeleton.
8. A patterning process which comprises the steps of:
forming an organic hard mask mainly comprising carbon on a body to be processed by a CVD method;
forming a resist under layer film on the organic hard mask by using the composition for forming a resist under layer film according to claim 2 ;
forming a resist pattern on the resist under layer film;
transferring the pattern to the resist under layer film by dry etching using the resist pattern as a mask;
transferring the pattern to the organic hard mask by dry etching using the resist under layer film to which the pattern has been transferred as a mask; and further
transferring the pattern to the body to be processed by dry etching using the organic hard mask to which the pattern has been transferred as a mask.
9. A patterning process which comprises the steps of:
forming an organic hard mask mainly comprising carbon on a body to be processed by a CVD method;
forming a resist under layer film on the organic hard mask by using the composition for forming a resist under layer film according to claim 3 ;
forming a resist pattern on the resist under layer film;
transferring the pattern to the resist under layer film by dry etching using the resist pattern as a mask;
transferring the pattern to the organic hard mask by dry etching using the resist under layer film to which the pattern has been transferred as a mask; and further
transferring the pattern to the body to be processed by dry etching using the organic hard mask to which the pattern has been transferred as a mask.
10. The patterning process according to claim 4 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
11. The patterning process according to claim 5 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
12. The patterning process according to claim 6 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
13. The patterning process according to claim 7 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
14. The patterning process according to claim 8 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
15. The patterning process according to claim 9 , wherein the body to be processed is a semiconductor apparatus substrate or a material in which any of a metal film, a metal carbide film, a metal oxide film, a metal nitride film, a metal oxycarbide film, and a metal oxynitride film is formed on the semiconductor apparatus substrate.
16. The patterning process according to claim 10 , wherein a metal constituting the body to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.
17. The patterning process according to claim 11 , wherein a metal constituting the body to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.
18. The patterning process according to claim 12 , wherein a metal constituting the body to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.
19. The patterning process according to claim 13 , wherein a metal constituting the body to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.
20. The patterning process according to claim 14 , wherein a metal constituting the body to be processed comprises silicon, titanium, tungsten, hafnium, zirconium, chromium, germanium, copper, aluminum, indium, gallium, arsenic, palladium, iron, tantalum, iridium, molybdenum, or an alloy thereof.