Die stacked image sensors and related methods
An image sensor. Implementations may include: a first die including a plurality of pixels; a second die including a plurality of transistors, capacitors, or both transistors and capacitors; a third die including analog circuitry, logic circuitry, or analog and logic circuitry. The first die may be hybrid bonded to the second die, and the second die may be fusion bonded to the third die. The plurality of transistors, capacitors or transistors and capacitors of the second die may be adapted to enable operation of the plurality of pixels of the first die. The analog circuitry, logic circuitry, and analog circuitry and logical circuitry may be adapted to perform signal routing.
1. A method of manufacturing an image sensor, the method comprising:
hybrid bonding a first wafer comprising a plurality of first die with a second wafer comprising a plurality of second die;
thinning the second wafer;
hybrid bonding the second wafer with a third wafer comprising a plurality of third die;
exposing a plurality of studs comprised in the second wafer;
wherein the plurality of first die each comprise a plurality of detectors adapted to convert photons to electrons;
wherein the plurality of second die each comprise a plurality of one of transistors, passive electrical components, and both transistors and passive electrical components; and
wherein the plurality of third die each comprise one of analog circuitry, logic circuitry, and analog circuitry and logic circuitry.
2. The method of claim 1 , wherein the plurality of second die are electrically coupled with the plurality of third die.
3. The method of claim 1 , further comprising forming a plurality of microlenses on a surface of the plurality of the detectors adapted to convert photons to electrons of each of the plurality of first die.