IP Library Granted Patent US 10,062,725
Granted Patent B2
US 10,062,725 · App. 14/770,107 · Granted Aug 28, 2018

Image sensor with anti-blooming gate

Inventors: Frédéric Barbier (Grenoble, FR); Frédéric Mayer (Voiron, FR)
Assignee: TELEDYNE E2V SEMICONDUCTORS SAS
H01L27/14654H04N5/3592H04N5/3594H01L27/14609
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Quick Facts
Patent No.
US 10,062,725
App. No.
14/770,107
Granted
Aug 28, 2018
Kind
B2
Abstract

The invention concerns active-pixel electronic image sensors. The pixel comprises a photodiode (PH) designed in a semiconductor active layer ( 12 ) and maintained at a nil reference potential, and above the active layer an anti-blooming gate (G 5 ) adjacent on one side to the photodiode and on another side to an evacuation drain ( 22 ). The sensor comprises means for applying to the anti-blooming gate, during most of the duration of integration, a blocking potential creating beneath the gate a potential barrier of a first height, and, during a series of brief pulses over the duration of integration, an anti-blooming potential creating a potential barrier of a second height, lower than the first. The fact of only applying the anti-blooming voltage during the brief pulses reduces the dark noise induced by tunneling effect by the electric field between gate and photodiode.

Claims (23)

1. A method for controlling a pixel of an image sensor, in which each pixel of the image sensor comprises at least one photodiode formed in a semiconductor active layer by a doped region of a first type of conductivity covered by a surface region of the opposite type maintained at a nil reference potential, a drain, and an anti-blooming gate above the active layer, adjacent on one side to the photodiode and on another side to the drain for evacuating electric charge set to a reference potential, the method comprising:

operating the sensor periodically with in each period a determined duration of integration,

during said duration of integration, setting the anti-blooming gate to a main blocking potential creating, in the active layer beneath the anti-blooming gate, a first potential barrier of a first height, and

generating a periodic pulsed signal applying a series of brief pulses over the duration of integration, to set periodically the anti-blooming gate to a positive anti-blooming potential creating, beneath the anti-blooming gate, a second potential barrier of a second height, lower than the first height, the second potential barrier retaining the charge representing lighting in the photodiode up to a blooming threshold,

wherein

a ratio of the duration of integration to a cumulative duration of the brief pulses is greater than or equal to 20, and

a duty ratio of the period of the brief pulses to the duration of the brief pulses is greater than or equal to 20.

2. The method according to claim 1 , wherein the blocking potential is equal to the nil reference potential.

3. The method according to claim 1 , wherein the blocking potential is negative with respect to the nil reference potential.

4. The method according to claim 1 , wherein the anti-blooming potential lies between 0.5 and 0.9 volts.

5. The method according to claim 1 , wherein the period of the pulses is a read-out period of rows of pixels of a matrix sensor.

6. An image sensor comprising:

an array of pixels, each pixel comprising at least one photodiode in a semiconductor active layer with a doped region of a first type of conductivity covered by a surface region of the opposite type maintained at a nil reference potential,

a drain, and

an anti-blooming gate, above the active layer, adjacent on one side to the photodiode and on another side to the drain to evacuate electric charge set to a reference potential,

wherein

the sensor is configured to operate periodically with in each period a determined duration of integration,

the sensor further includes circuitry configured to

during said duration of integration, apply to the anti-blooming gate, a main blocking potential creating, in the active layer beneath the anti-blooming gate, a first potential barrier of a first height,

generate a periodic pulsed signal applying a series of brief pulses over the duration of integration, to set periodically the anti-blooming gate to a positive anti-blooming potential creating, beneath the anti-blooming gate, a second potential barrier of a second height, lower than the first height, the second potential barrier retaining the charge representing lighting in the photodiode up to a blooming threshold,

a ratio of the duration of integration to the cumulative duration of the brief pulses is greater than or equal to 20, and

a duty ratio of the period of the brief pulses to the duration of the brief pulses is greater than or equal to 20.

7. The method according to claim 6 , wherein the period of the pulses is a read-out period of rows of pixels of a matrix sensor.

Assignments (2)
CHANGE OF NAME Recorded Mar 2, 2018
From: E2V SEMICONDUCTORS
To: TELEDYNE E2V SEMICONDUCTORS SAS
Reel/Frame 045651/0012 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 25, 2015
From: BARBIER, FRÉDÉRIC; MAYER, FRÉDÉRIC
To: E2V SEMICONDUCTORS
Reel/Frame 036407/0925 →
Priority Claims (1)
FR 13 51786 · Feb 28, 2013 · national
Continuity (1)
Related Publication 20160005785A1 · Jan 7, 2016