IP Library Granted Patent US 10,032,810
Granted Patent B2
US 10,032,810 · App. 14/793,480 · Granted Jul 24, 2018

Image sensor with dual layer photodiode structure

Inventors: Yingjun Bai (San Jose, CA); Qun Sun (San Jose, CA)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L27/14605H01L27/1461H01L27/14607H01L27/14621H01L27/14647H01L27/14652H04N5/33H04N5/332H04N5/369H04N9/045
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,032,810
App. No.
14/793,480
Granted
Jul 24, 2018
Kind
B2
Abstract

An image system with a dual layer photodiode structure is provided for processing color images. In particular, the image system can include an image sensor that can include photodiodes with a dual layer photodiode structure. In some embodiments, the dual layer photodiode can include a first layer of photodiodes (e.g., a bottom layer), an insulation layer disposed on the first layer of photodiodes, and a second layer of photodiodes (e.g., a top layer) disposed on the insulation layer. The first layer of photodiodes can include one or more suitable pixels (e.g., green, blue, clear, luminance, and/or infrared pixels). Likewise, the second layer of photodiodes can include one or more suitable pixels (e.g., green, red, clear, luminance, and/or infrared pixels). An image sensor incorporating dual layer photodiodes can gain light sensitivity with additional clear pixels and maintain luminance information with green pixels.

Claims (68)

1. An image sensor comprising:

a substrate having a major surface for receiving impinging light; and

a photodiode array disposed within the substrate, wherein the photodiode array comprises a 2×2 unit cell, the 2×2 unit cell for repeating within the substrate and comprising:

a first photodiode in the 2×2 unit cell comprising a first blue pixel in a top layer of the substrate disposed on top of a first red pixel in a bottom layer of the substrate, wherein the top layer is closer to the major surface than the bottom layer;

a first insulating layer disposed between the red pixel and the first blue pixel;

a magenta color filter disposed overlapping the first photodiode;

a second photodiode in the 2×2 unit cell comprising a first green pixel disposed in the bottom layer and a third green pixel in the top layer and disposed on top of the first green pixel;

a third photodiode in the 2×2 unit cell comprising a second green pixel disposed in the bottom layer and a fourth green pixel in the top layer and disposed on top of the second green pixel diagonally disposed from the second photodiode in the 2×2 unit cell; and

a fourth photodiode in the 2×2 unit cell diagonally disposed from the first photodiode in the 2×2 unit cell comprising a pixel selected from a group consisting of a first clear pixel, a first infrared pixel, a blue pixel in the top layer disposed on top of a green pixel in the bottom layer, a green pixel in the top layer and disposed on top of a red pixel in the bottom layer, a green pixel in the top layer and disposed on top of an infrared pixel in the bottom layer, and a blue pixel in the top layer and disposed on top of an infrared pixel in the bottom layer.

2. The image sensor of claim 1 further comprising:

a second insulating layer disposed between the third green pixel and the first green pixel; and

a third insulating layer disposed between fourth green pixel and the second green pixel.

3. The image sensor of claim 1 , wherein the fourth photodiode comprises the first infrared pixel.

4. The image sensor of claim 3 wherein:

the first infrared pixel is disposed in the bottom layer; and

the image sensor further comprises a second infrared pixel in the top layer and disposed on top of the first infrared pixel.

5. The image sensor of claim 3 further comprising an infrared cut-off filter disposed overlapping at least a portion of the photodiode array.

6. The image sensor of claim 1 , wherein the fourth photodiode comprises the first clear pixel.

7. The image sensor of claim 6 , wherein:

the first clear pixel is disposed in the bottom layer; and

the image sensor further comprises:

a second clear pixel in the top layer and disposed on top of the first clear pixel; and

a second insulating layer disposed between the second clear pixel and the first clear pixel.

8. The image sensor of claim 1 further in combination with a control structure configured to:

bin the second and third photodiodes along a first direction to provide a first pixel group;

bin the first and fourth photodiodes along a second direction to provide a second pixel group;

combine the first pixel group and the second pixel group to provide a binned pixel cluster; and

interpolate the binned pixel cluster to provide an output pixel image.

9. An image sensor comprising:

a substrate having a major surface for receiving impinging light; and

a photodiode array disposed within the substrate, wherein the photodiode array comprises a 2×2 unit cell, the 2×2 unit cell for repeating within the substrate and comprising:

a first photodiode in the 2×2 unit cell comprising a first blue pixel in a first layer of the substrate disposed on top of a first red pixel in a second layer of the substrate, wherein the first layer is closer to the major surface than the second layer;

a first insulating layer disposed between the red pixel and the first blue pixel;

a magenta color filter disposed overlapping the first photodiode;

a second photodiode in the 2×2 unit cell comprising a first pixel sensitive to at least two wavelengths of light disposed in the second layer and a third pixel in the first layer and disposed on top of the first pixel;

a third photodiode in the 2×2 unit cell comprising a second pixel sensitive to the at least two wavelengths of light disposed in the second layer and a fourth pixel in the first layer and disposed on top of the second pixel, wherein the third photodiode is diagonally disposed from the second photodiode in the 2×2 unit cell; and

a fourth photodiode in the 2×2 unit cell diagonally disposed from the first photodiode in the 2×2 unit cell comprising a pixel selected from a group consisting of a first green pixel, a clear pixel, a green pixel in the first layer and disposed on top of an infrared pixel in the second layer, and a blue pixel in the first layer and disposed on top of an infrared pixel in the second layer.

10. The image sensor of claim 9 , wherein:

the second photodiode comprises a first clear pixel; and

the third photodiode comprises a second clear pixel.

11. The image sensor of claim 10 , wherein the fourth photodiode comprises the first green pixel.

12. The image sensor of claim 11 , wherein:

the first green pixel is in the second layer; and

the image sensor further comprises a second green pixel in the first layer and disposed on top of the first green pixel.

13. The image sensor of claim 10 , wherein:

the first clear pixel and the second clear pixel are disposed in the second layer;

the second photodiode further comprises a third clear pixel in the first layer and disposed on top of the first clear pixel; and

the third photodiode further comprises a fourth clear pixel in the first layer and disposed on top of the second clear pixel.

14. The image sensor of claim 9 , wherein:

the second photodiode comprises a first clear pixel;

the third photodiode comprises a second clear pixel; and

the fourth photodiode comprises the clear pixel.

15. An image sensor comprising:

a substrate having a major surface for receiving impinging light; and

a photodiode array disposed within the substrate, wherein the photodiode array comprises a 2×2 unit cell, the 2×2 unit cell for repeating within the substrate and comprising:

a first photodiode in the 2×2 unit cell comprising a first blue pixel in a top layer of the substrate disposed on top of a first red pixel in a bottom layer of the substrate, wherein the top layer is closer to the major surface than the bottom layer;

a first insulating layer disposed between the red pixel and the first blue pixel;

a magenta color filter disposed overlapping the first photodiode;

a second photodiode in the 2×2 unit cell comprising a first green pixel disposed in the bottom layer and a third green pixel in the top layer and disposed on top of the first green pixel;

a third photodiode in the 2×2 unit cell comprising a second green pixel disposed in the bottom layer and a fourth green pixel in the top layer and disposed on top of the second green pixel, wherein diagonally disposed from the second photodiode in the 2×2 unit cell; and

a fourth photodiode in the 2×2 unit cell comprising a first infrared pixel diagonally disposed from the first photodiode in the 2×2 unit cell.

16. The image sensor of claim 15 further comprising:

a second insulating layer disposed between the third green pixel and the first green pixel; and

a third insulating layer disposed between the fourth green pixel and the second green pixel.

17. The image sensor of claim 15 , wherein:

the first infrared pixel is disposed in the bottom layer; and

the fourth photodiode further comprises a second infrared pixel in the top layer and disposed on top of the first infrared pixel.

18. The image sensor of claim 15 further comprising an infrared cut-off filter overlapping at least a portion of the photodiode array.

Assignments (5)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 038620, FRAME 0087 Recorded Jun 22, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064070/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE INCORRECT PATENT NUMBER 5859768 AND TO RECITE COLLATERAL AGENT ROLE OF RECEIVING PARTY IN THE SECURITY INTEREST PREVIOUSLY RECORDED ON REEL 038620 FRAME 0087. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Aug 25, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 039853/0001 →
SECURITY INTEREST Recorded Apr 15, 2016
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 038620/0087 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 14, 2015
From: APTINA IMAGING CORPORATION
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 036555/0382 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 24, 2015
From: BAI, YINGJUN; SUN, QUN
To: APTINA IMAGING CORPORATION
Reel/Frame 036176/0866 →
Continuity (2)
Continuation 12826313 · Jun 29, 2010
Related Publication 20150311242A1 · Oct 29, 2015