Method of manufacturing silicon carbide semiconductor device

1. A method of manufacturing a silicon carbide semiconductor device, comprising the steps of:

preparing a silicon carbide substrate;

forming a first electrode on said silicon carbide substrate;

establishing ohmic contact between said silicon carbide substrate and said first electrode by irradiating said first electrode with laser beams; and

forming a second electrode on said first electrode,

in said step of establishing ohmic contact, a surface of said first electrode being irradiated with laser beams such that arithmetic mean roughness of a surface of said second electrode is not greater than 0.2 μm.

2. The method of manufacturing a silicon carbide semiconductor device according to claim 1 , wherein

said first electrode contains nickel.

3. The method of manufacturing a silicon carbide semiconductor device according to claim 1 , wherein

said second electrode contains gold.

4. The method of manufacturing a silicon carbide semiconductor device according to claim 1 , wherein

said second electrode includes a plurality of layers, and

said plurality of layers include a first layer containing titanium, a second layer containing nickel, and a third layer containing gold.

5. The method of manufacturing a silicon carbide semiconductor device according to claim 1 , further comprising, before said step of forming a first electrode, the steps of;

grinding a main surface of said silicon carbide substrate on which said first electrode is to be formed; and

removing a damaged layer by etching ground said main surface, wherein

in said step of establishing ohmic contact, the surface of said first electrode is irradiated with laser beams at laser irradiation intensity not lower than 1.5 J/cm 2 and not higher than 2.4 J/cm 2 .

6. The method of manufacturing a silicon carbide semiconductor device according to claim 1 , wherein

said first electrode contains silicon.