Pixel array area optimization using stacking scheme for hybrid image sensor with minimal vertical interconnects
Embodiments of a hybrid imaging sensor that optimizes a pixel array area on a substrate using a stacking scheme for placement of related circuitry with minimal vertical interconnects between stacked substrates and associated features are disclosed. Embodiments of maximized pixel array size/die size (area optimization) are disclosed, and an optimized imaging sensor providing improved image quality, improved functionality, and improved form factors for specific applications common to the industry of digital imaging are also disclosed.
1. An imaging sensor comprising:
a plurality of substrates comprising at least a first substrate and a second substrate;
a pixel array located on the first substrate and comprising a plurality of pixel columns;
a plurality of supporting circuits located on the second substrate and comprising a plurality of circuit columns, where one circuit column corresponds with one pixel column, wherein each of the plurality of circuit columns is defined as having an area that is substantially the same as and corresponds with an area of a corresponding pixel column;
a plurality of pixel column buses and a plurality of circuit column buses, wherein there is one pixel column bus per pixel column residing on the first substrate and one circuit column bus per circuit column residing on said second substrate; and
a plurality of interconnects, wherein at least one interconnect provides an electrical communication between one pixel column bus and one corresponding circuit column bus;
wherein at least a portion of each of the plurality of pixel column buses is superimposed with at least a portion of each of the corresponding plurality of circuit column buses, wherein said at least one interconnect is located anywhere along the superimposition of one pixel column bus and one corresponding circuit column bus.
2. The imaging sensor of claim 1 , wherein the second substrate is disposed remotely relative to said first substrate;
wherein said plurality of supporting circuits are electrically connected to, and in electrical communication with, said pixel array; and
wherein said second substrate is disposed behind said pixel array relative to an object to be imaged.
3. The imaging sensor of claim 1 , wherein each of the plurality of pixel columns comprises a plurality of detecting elements;
wherein the superimposition of each pixel column bus and each circuit column bus are such that the each pixel column bus and each corresponding circuit column bus are substantially aligned.
4. The imaging sensor of claim 1 , wherein each of the plurality of pixel columns comprises an aspect ratio and each of the plurality of circuit columns comprises an aspect ratio;
wherein the aspect ratio of each of the plurality of pixel columns is the same and wherein the aspect ratio of each of the plurality of circuit columns is the same;
wherein the aspect ratio of each of the plurality of pixel columns comprises an area and wherein the aspect ratio of each of the plurality of circuit columns comprises an area, wherein the area of the plurality of pixel columns corresponds with the area of the plurality of circuit columns, and wherein the areas of the corresponding aspect ratios are substantially the same.
5. The imaging sensor of claim 1 , wherein the electrical connection between one pixel column bus and one circuit column bus is accomplished by a single interconnect.
6. The imaging sensor of claim 1 , wherein the electrical connection between one pixel column bus and one circuit column bus is accomplished by two interconnects.
7. The imaging sensor of claim 1 , wherein said imaging sensor is backside illuminated.
8. The imaging sensor of claim 1 , wherein said pixel array covers a substantial majority of a surface of said first substrate.
9. The imaging sensor of claim 1 , wherein said pixel array covers more than twenty-five percent of a surface of said first substrate.
10. The imaging sensor of claim 1 , wherein one of said supporting circuits is an analog to digital converter.
11. The imaging sensor of claim 1 , wherein one of said supporting circuits is an amplifier circuit.
12. The imaging sensor of claim 1 , wherein said second substrate is aligned with said first substrate in a stacked configuration.
13. The imaging sensor of claim 1 , wherein said second substrate is disposed behind said first substrate and displaced laterally therefrom.
14. The imaging sensor of claim 1 , wherein said first substrate is made of primarily silicon material.
15. The imaging sensor of claim 1 , wherein said first substrate is made of primarily of “High-Z” semiconductor material, such as Cadmium Telluride.
16. The imaging sensor of claim 1 , wherein said first substrate is made of III-V semiconductor materials.
17. The imaging sensor of claim 1 , wherein the plurality of substrates further comprise a plurality of subsequent supporting substrates; wherein said first substrate and said plurality of subsequent supporting substrates are stacked in alignment so that a plurality of communication columns are formed in a multi-layer stack.
18. An imaging sensor comprising:
a plurality of substrates comprising a first substrate and a second substrate;
a pixel array located on the first substrate comprising a plurality of pixel columns; and
a plurality of supporting circuits comprising a plurality of circuit columns located on the second substrate, wherein said plurality of supporting circuits are electrically connected to said pixel array;
a plurality of pixel column buses located on the first substrate and a plurality of circuit column buses located on the second substrate, wherein there is one pixel column bus per pixel column residing on the first substrate and one circuit column bus per circuit column residing on said second, subsequent supporting substrate;
wherein at least a portion of each of the plurality of pixel column buses is superimposed with at least a portion of each of the corresponding plurality of circuit column buses; and
wherein at least one interconnect electronically connects each of the pixel column buses to each of the corresponding circuit column buses.
19. The imaging sensor of claim 18 , wherein the second substrate is disposed remotely relative to said first substrate;
wherein said plurality of supporting circuits are electrically connected to, and in electrical communication with, said pixel array; and
wherein said second substrate is disposed behind said pixel array relative to an object to be imaged.
20. The imaging sensor of claim 18 , wherein each of the plurality of pixel columns comprises a plurality of detecting elements;
wherein the superimposition of each pixel column bus and each circuit column bus are such that the each pixel column bus and each corresponding circuit column bus are substantially aligned.
21. The imaging sensor of claim 18 , wherein each of the plurality of pixel columns comprises an aspect ratio and each of the plurality of circuit columns comprises an aspect ratio;
wherein the aspect ratio of each of the plurality of pixel columns is the same and wherein the aspect ratio of each of the plurality of circuit columns is the same;
wherein the aspect ratio of each of the plurality of pixel columns comprises an area and wherein the aspect ratio of each of the plurality of circuit columns comprises an area, wherein the area of the plurality of pixel columns corresponds with the area of the plurality of circuit columns, and wherein the areas of the corresponding aspect ratios are substantially the same.
22. The imaging sensor of claim 18 , wherein the electrical connection between one pixel column bus and one circuit column bus is accomplished by a single interconnect.
23. The imaging sensor of claim 18 , wherein the electrical connection between one pixel column bus and one circuit column bus is accomplished by a two interconnects.
24. The imaging sensor of claim 18 , wherein said imaging sensor is backside illuminated.
25. The imaging sensor of claim 18 , wherein said pixel array covers a substantial majority of a surface of said first substrate.
26. The imaging sensor of claim 18 , wherein said pixel array covers more than twenty-five percent of a surface of said first substrate.
27. The imaging sensor of claim 18 , wherein one of said supporting circuits is an analog to digital converter.
28. The imaging sensor of claim 18 , wherein one of said supporting circuits is an amplifier circuit.
29. The imaging sensor of claim 18 , wherein said second substrate is aligned with said first substrate in a stacked configuration.
30. The imaging sensor of claim 18 , wherein said second substrate is disposed behind said first substrate and displaced laterally therefrom.
31. The imaging sensor of claim 18 , wherein said first substrate is made of primarily silicon material.
32. The imaging sensor of claim 18 , wherein said first substrate is made of primarily of “High-Z” semiconductor material, such as Cadmium Telluride.
33. The imaging sensor of claim 18 , wherein said first substrate is made of III-V semiconductor materials.
34. The imaging sensor of claim 18 , wherein the plurality of substrates further comprise a plurality of subsequent supporting substrates; wherein said first substrate and said plurality of subsequent supporting substrates are stacked in alignment so that a plurality of communication columns are formed in a multi-layer stack.