Semiconductor structure with ultra thick metal and manufacturing method thereof
The present disclosure provides a semiconductor structure having an ultra thick metal (UTM). The semiconductor structure includes a substrate, a metal layer over the substrate, and an UTM over the metal layer. An area density of the UTM is greater than 40% and a thickness of the UTM is equal to or greater than 6 micrometer. The present disclosure provides a method for manufacturing a semiconductor structure having a UTM. The method includes patterning a dielectric layer with a plurality of trenches by a first mask, patterning a photoresist positioning on a mesa between adjacent trenches by a second mask, and selectively plating conductive materials in the plurality of trenches.
1. A semiconductor structure, comprising:
a substrate;
a metal layer over the substrate;
an ultra thick metal (UTM) over the metal layer, the UTM comprising a top surface;
a photo-sensitive polymer layer surrounding the UTM, the top surface of the UTM being coplanar with a top surface of the photo-sensitive polymer layer; and
a post passivation interconnect (PPI) over the UTM, the PPI comprising a vertical sidewall,
wherein a thickness of the UTM is equal to or greater than 6 micrometer, the UTM and the metal layer being composed of substantial identical material.
2. The semiconductor structure of claim 1 , wherein UTM is positioned in a trapezoidal trench having a shorter side in proximity to the metal layer the, an acute angle between a sidewall and an extension of the shorter side of the trapezoidal trench is in a range of from about 40 degrees to about 70 degrees.
3. The semiconductor structure of claim 1 , further comprising an isolation layer between the metal layer and the UTM.
4. The semiconductor structure of claim 3 , further comprising a via in a passivation layer above the UTM, electrically connecting the PPI and the UTM.
5. The semiconductor structure of claim 1 , wherein a critical dimension of a line pitch of the UTM is in a range of from about 20 μm to about 375 μm.
6. The semiconductor structure of claim 1 , further comprising a barrier layer between the UTM and a dielectric layer surrounding the UTM.
7. The semiconductor structure of claim 6 , wherein the barrier layer comprises SiON.
8. A semiconductor structure, comprising:
a substrate;
a metal layer over the substrate;
an inductor over the metal layer, comprising:
a lower metal having a top surface;
a photo-sensitive polymer layer surrounding the lower metal, the top surface of the lower metal being coplanar with a top surface of the photo-sensitive polymer layer; and
an upper metal electrically connecting to the lower metal through a via; and
an isolation layer between the metal layer and the lower metal of the inductor,
wherein a thickness of the lower metal is equal to or greater than 6 μm.
9. The semiconductor structure of claim 8 , further comprising a magnetic core between the upper metal and the lower metal.
10. The semiconductor structure of claim 9 , wherein the via and the magnetic core are in a passivation layer below the upper metal.
11. The semiconductor structure of claim 8 , wherein the upper metal is a post passivation interconnect (PPI) having a thickness equal to or greater than about 10 μm.
12. The semiconductor structure of claim 8 , wherein the lower metal comprises a line pattern, a cross section of the line pattern comprising an upper surface in proximity to the via and a lower surface opposite to the upper surface,
wherein a length of the upper surface is greater than a length of the lower surface, and
a ratio of one half of a length difference between the upper surface and the lower surface and the thickness of the lower metal is in a range of from about 0.8 to about 2.8.
13. The semiconductor structure of claim 8 , wherein the lower metal comprises a substantially parallel line pattern having a critical dimension of a line pitch of form about 20 μm to about 375 μm.
14. A method for manufacturing a semiconductor structure, comprising:
patterning a photo-sensitive polymer layer with a plurality of trenches by a first mask, the first mask having a first line pitch;
curing the photo-sensitive polymer layer after patterning the same with a plurality of trenches;
patterning a photoresist positioning on a mesa between adjacent trenches by a second mask, the second mask having a second line pitch, the first mask and the second mask having substantially identical pattern, and the second line pitch being greater than the first line pitch; and
selectively plating conductive material in the plurality of trenches while the photoresist being on the mesa.
15. The method of claim 14 , wherein the patterning the photo-sensitive polymer layer with a plurality of trenches comprises forming the plurality of trenches having a depth equal to or greater than 6 μm.
16. The method of claim 14 , further comprising:
removing the photoresist after the selectively plating so as to expose a sidewall of the as-plated conductive material on the mesa; and
planarizing the conductive material to be coplanar with the mesa.
17. The method of claim 14 , further comprising:
forming a seed layer for the conductive materials conformal to the plurality of trenches before the patterning the photoresist.