Semiconductor structure with an interconnect level having a conductive pad and metallic structure such as a base of a crackstop
View Patent ↗A semiconductor structure with an interconnect level above a substrate and including a conductive pad and a metallic structure, such as a base of a crackstop. A first dielectric layer is above the conductive pad and above the metallic structure. A first opening in the first dielectric layer is aligned with and exposes the conductive pad and a second opening is aligned with and exposes the metallic structure. A metallic liner lines the first opening and the second opening and is on the top surface of the first dielectric layer. A second dielectric layer is above the metallic liner and a third dielectric layer is above the second dielectric layer. A third opening exposes a portion of the metal liner above the conductive pad and a copper plug and pedestal are in the third opening on the exposed portion of the metal liner.
1. A structure comprising:
a metallic structure positioned within an interconnect level above a substrate, the metallic structure being adjacent to a kerf of the substrate;
a first dielectric layer above the interconnect level, the first dielectric layer comprising an opening aligned with and above the metallic structure;
a metallic liner above the first dielectric layer, within the opening, and on the metallic structure;
a second dielectric layer above the metallic liner;
a third dielectric layer above the second dielectric layer, the third dielectric layer being thicker than either the first dielectric layer or the second dielectric layer;
a conductive pad within the interconnect level, the first dielectric layer further comprising a second opening aligned with and above the conductive pad and the metallic liner further being within the second opening and on the conductive pad;
a copper plug on the metallic liner above the conductive pad;
a copper pedestal on the copper plug; and
a solder structure on the copper pedestal.
2. The structure of claim 1 , the third dielectric layer comprising a polyimide dielectric material, a photo sensitive polyimide dielectric material, or an organic dielectric material.
3. The structure of claim 1 , the first dielectric layer comprising an oxide and the second dielectric layer comprising a nitride.
4. The structure of claim 1 , the metallic liner comprising tantalum, tantalum-nitride, titanium, tungsten chromium, copper, or any combination thereof.
5. The structure of claim 1 , further comprising:
a second copper plug on the metallic liner above the metallic structure;
a second copper pedestal on the second copper plug; and
a capping layer on the second copper pedestal.
6. A structure comprising:
an interconnect level above a substrate and comprising a conductive pad and a metallic structure positioned laterally adjacent to the conductive pad, the metallic structure being a base of a crackstop feature and having a greater height than the conductive pad;
a first dielectric layer on the interconnect level with a first opening extending vertically through the first dielectric layer to the metallic structure and a second opening extending vertically through the first dielectric layer to the conductive pad and;
a metallic liner on the first dielectric layer lining the first opening so as to be adjacent to the metallic structure and lining the second opening so as to be adjacent to the conductive pad;
a second dielectric layer above the metallic liner; and,
a third dielectric layer above the second dielectric layer with a third opening aligned above the conductive pad and extending vertically through the third dielectric layer and the second dielectric layer to the metallic liner and with a fourth opening located between the conductive pad and the metallic structure and extending vertically through the third dielectric layer, the second dielectric layer and the metallic liner and stopping at a top surface of the first dielectric layer such that a portion of the third dielectric layer remains above the metallic structure,
the third dielectric layer being thicker than the first dielectric layer and thicker than the second dielectric layer, and
the third dielectric layer and second dielectric layer having stacked portions aligned above the metallic structure.
7. The structure of claim 6 , the third dielectric layer comprising a polyimide dielectric material, a photo sensitive polyimide dielectric material, or an organic dielectric material.
8. The structure of claim 6 , the first dielectric layer comprising an oxide.
9. The structure of claim 6 , the second dielectric layer comprising a nitride.
10. The structure of claim 6 , the metallic liner comprising tantalum, tantalum-nitride, titanium, tungsten chromium, copper, or any combination thereof.
11. The structure of claim 6 , further comprising:
a copper plug on the metallic liner in the second opening and the third opening aligned above the conductive pad such that an upper portion of the copper plug is laterally surrounded by the third dielectric layer.
12. The structure of claim 11 , further comprising:
a copper pedestal on the copper plug and extending laterally onto a top surface of the third dielectric layer; and
a solder structure on the copper pedestal.
13. A structure comprising:
an interconnect level above a substrate and comprising a conductive pad and a metallic structure positioned laterally adjacent to the conductive pad;
a first dielectric layer on the interconnect level with a first opening extending vertically through the first dielectric layer to the metallic structure and a second opening extending vertically through the first dielectric layer to the conductive pad and;
a metallic liner on the first dielectric layer lining the first opening so as to be adjacent to the metallic structure and lining the second opening so as to be adjacent to the conductive pad;
a second dielectric layer above the metallic liner;
a third dielectric layer above the second dielectric layer with a third opening aligned above the conductive pad and extending vertically through the third dielectric layer and the second dielectric layer to the metallic liner, with a fourth opening located between the conductive pad and the metallic structure and extending vertically through the third dielectric layer, the second dielectric layer and the metallic liner to the first dielectric layer, and with a fifth opening aligned above the metallic structure and extending vertically through the third dielectric layer and the second dielectric layer to the metallic liner,
the third dielectric layer being thicker than the first dielectric layer and thicker than the second dielectric layer;
a copper plug on the metallic liner in the second opening and the third opening aligned above the conductive pad such that an upper portion of the copper plug is laterally surrounded by the third dielectric layer;
a copper pedestal on the copper plug and extending laterally onto a top surface of the third dielectric layer; and
a solder structure on the copper pedestal.
14. The structure of claim 13 , the third dielectric layer comprising a polyimide dielectric material, a photo sensitive polyimide dielectric material, or an organic dielectric material.
15. The structure of claim 13 , the first dielectric layer comprising an oxide.
16. The structure of claim 13 , the second dielectric layer comprising a nitride.
17. The structure of claim 13 , the metallic liner comprising tantalum, tantalum-nitride, titanium, tungsten chromium, copper, or any combination thereof.
18. The structure of claim 13 , further comprising:
a second copper plug on the metallic liner in the first opening and the fifth opening aligned above the metallic structure such that an upper portion of the second copper plug is laterally surrounded by the third dielectric layer;
a second copper pedestal on the second copper plug and extending laterally onto the top surface of the third dielectric layer; and
a capping layer on the second copper pedestal.