Plasma processing apparatus
A plasma processing apparatus includes a processing chamber, a table disposed in the processing chamber, a dielectric window provided at the processing chamber, and a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window. The dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween.
1. A plasma processing apparatus comprising:
a processing chamber:
a table disposed in the processing chamber;
a dielectric window provided at the processing chamber;
a slot plate provided on the dielectric window; and
a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window,
wherein the dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween, and
wherein an upper end portion of the surrounding body is closer to a center of the surrounding body than a main body of the surrounding body, the upper end portion extends in a vertical direction, a horizontal portion between the upper end portion and the main body extends toward the center of the surrounding body, a lower end of an outer periphery of the dielectric window which defines the predetermined gap is located at an outer side of the upper end portion and above the horizontal portion.
2. The plasma processing apparatus of claim 1 , further comprising:
a supporting member configured to support the surrounding body; and
an insulating pin standing upright from the supporting member,
wherein the pin is positioned inside a position restricting recess formed at a bottom surface of the surrounding body, and
the supporting member forms a part of the processing chamber.
3. A plasma processing apparatus comprising:
a processing chamber;
a table disposed in the processing chamber;
a dielectric window provided at the processing chamber;
a slot plate provided on the dielectric window; and
a surrounding body made of a dielectric material surrounding the processing space between the table and the dielectric window,
wherein a bottom surface of the dielectric window has a recess, an opening end of the recess of the dielectric window having a downwardly protruding protrusion, a side surface of the outer side of the protrusion faces an inner surface of the processing chamber, and a bottom surface of the protrusion and a top surface of the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween, and
wherein the predetermined gap between the bottom surface of the protrusion and the top surface of the surrounding body is greater than or equal to 4 mm and smaller than or equal to 15 mm.
4. The plasma processing apparatus of claim 3 , wherein an upper end portion of the surrounding body is closer to a center of the surrounding body than a main body of the surrounding body,
the upper end portion extends in a vertical direction,
a horizontal portion between the upper end portion and the main body extends toward the center of the surrounding body,
a lower end of the protrusion of the dielectric window which defines the predetermined gap is located at an outer side of the upper end portion and above the horizontal portion.
5. The plasma processing apparatus of claim 3 , further comprising:
a supporting member configured to support the surrounding body; and
an insulating pin standing upright from the supporting member,
wherein the pin is positioned inside a position restricting recess formed at a bottom surface of the surrounding body, and
the supporting member forms a part of the processing chamber.