IP Library Granted Patent US 10,842,058
Granted Patent B2
US 10,842,058 · App. 14/902,198 · Granted Nov 17, 2020

Metal foil for electromagnetic shielding, electromagnetic shielding material, and shielding cable

Inventor: Koichiro Tanaka (Ibaraki, JP)
Assignee: JX Nippon Mining & Metals Corporation
H05K9/0088B32B15/01B32B15/013B32B15/015B32B15/017B32B15/018B32B15/04B32B15/043B32B15/08B32B15/18B32B15/20C23C28/00C23C28/02C23C28/021C23C28/023C23C30/00C23C30/005C25D5/10C25D5/12C25D5/50C25D5/505C25D7/06C25D7/0614H05K9/00H05K9/0081H05K9/0084H05K9/0098C25D1/04C25D3/12C25D3/20C25D3/22C25D3/30C25D3/38C25D3/562Y10T428/1266Y10T428/1291Y10T428/12431Y10T428/12438Y10T428/12569Y10T428/12611Y10T428/12618Y10T428/12681Y10T428/12687Y10T428/12694Y10T428/12708Y10T428/12715Y10T428/12792Y10T428/12799Y10T428/12861Y10T428/12868Y10T428/12875Y10T428/12882Y10T428/12889Y10T428/12896Y10T428/12903Y10T428/12917Y10T428/12924Y10T428/12931Y10T428/12937Y10T428/12944Y10T428/12951Y10T428/12958Y10T428/12972Y10T428/12979Y10T428/265Y10T428/27
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Quick Facts
Patent No.
US 10,842,058
App. No.
14/902,198
Granted
Nov 17, 2020
Kind
B2
Abstract

A metal foil for electromagnetic shielding, comprising: a metal foil base having a thickness of exceeding 4 μm, an alloy layer having an A element configured of Sn or In and a B element group selected from the group consisting of one or more of Ag, Ni, Fe and Co formed on one or both surfaces of the base, and an underlayer having the B element group formed between the alloy layer and the base, wherein an adhesion amount of the A element is 10 to 300 μmol/dm 2 , and a total adhesion amount of the B element group is 40 to 900 μmol/dm 2 .

Claims (20)

1. A metal foil for electromagnetic shielding, comprising:

a metal foil base having a thickness exceeding 4 μm, an alloy layer having an A element comprising Sn and a B element selected from the group consisting of Ag, Ni, Fe, Co and combinations thereof, formed on one or both surfaces of the metal foil base, and an underlayer comprising a B element selected from the group consisting of Ag, Ni, and Co, wherein the underlayer is formed between the alloy layer and the metal foil base, wherein

a total adhesion amount of the A element per surface is 10 to 300 μmol/dm 2 , and a total adhesion amount of the B element per surface is 40 to 900 μmol/dm 2 ,

and wherein an oxide layer having a thickness between 1 and 50 nm and comprising the A element is formed on the outermost surface of the alloy layer.

2. The metal foil for electromagnetic shielding according to claim 1 , wherein the alloy layer further includes a C element selected from the group consisting of P, W, and combinations thereof.

3. The metal foil for electromagnetic shielding according to claim 1 , wherein a total content of Cu, Al and Zn included in the alloy layer is 10 wt % or less.

4. The metal foil for electromagnetic shielding according to claim 1 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy.

5. The metal foil for electromagnetic shielding according to claim 1 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer.

6. An electromagnetic shielding material, comprising the metal foil for electromagnetic shielding according to claim 1 , and a resin layer laminated on one surface of the metal foil.

7. The electromagnetic shielding material according to claim 6 , wherein the resin layer is a resin film.

8. A shielding cable shielded by the electromagnetic shielding material according to claim 7 .

9. A shielding cable shielded by the electromagnetic shielding material according to claim 6 .

10. The metal foil for electromagnetic shielding according to claim 1 , wherein the alloy layer is an intermetallic compound.

11. The metal foil for electromagnetic shielding according to claim 10 , wherein the alloy layer further includes a C element selected from the group consisting of P, W, and combinations thereof.

12. The metal foil for electromagnetic shielding according to claim 11 , wherein a total content of the C element to the entire alloy layer is 40 wt % or less.

13. The metal foil for electromagnetic shielding according to claim 10 , wherein a total content of Cu, Al and Zn included in the alloy layer is 10 wt % or less.

14. The metal foil for electromagnetic shielding according to claim 10 , wherein the base is composed of gold, silver, platinum, stainless steel, iron, nickel, zinc, copper, a copper alloy, aluminum or an aluminum alloy.

15. The metal foil for electromagnetic shielding according to claim 10 , wherein the base is aluminum or an aluminum alloy, and wherein a Zn layer is formed between the base and the underlayer.

16. The metal foil for electromagnetic shielding according to claim 2 , wherein a total content of the C element to the entire alloy layer is 40 wt % or less.

17. The metal foil for electromagnetic shielding according to claim 2 , wherein a total content of Cu, Al and Zn included in the alloy layer is 10 wt % or less.

Assignments (3)
CHANGE OF ADDRESS Recorded Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057453/0937 →
CHANGE OF ADDRESS Recorded Aug 11, 2021
From: JX NIPPON MINING & METALS CORPORATION
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 057160/0114 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 30, 2016
From: TANAKA, KOICHIRO
To: JX NIPPON MINING & METALS CORPORATION
Reel/Frame 039057/0830 →