IP Library Granted Patent US 9,455,400
Granted Patent B2
US 9,455,400 · App. 14/979,949 · Granted Sep 27, 2016

Magnetic tunnel junction for MRAM applications

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Quick Facts
Patent No.
US 9,455,400
App. No.
14/979,949
Granted
Sep 27, 2016
Kind
B2
Abstract

A MTJ in an MRAM array is disclosed with a composite free layer having a lower crystalline layer contacting a tunnel barrier and an upper amorphous layer for improved bit switching performance. According to one embodiment, the amorphous layer has a NiFeM 1 /NiFeM 2 configuration where M 1 and M 2 are Mg, Hf, Zr, Nb, or Ta, and M1 is unequal to M2. The crystalline layer is Fe, Ni, or FeB with a thickness of at least 6 Angstroms that affords a high magnetoresistive ratio. The M 1 and M 2 elements in the NiFeM 1 and NiFeM 2 layers each have a content of 5 to 30 atomic %. The NiFeM 1 /NiFeM 2 configuration substantially reduces bit line switching current and number of shorted bits. In an alternative embodiment, the crystalline layer may be a Fe/NiFe bilayer. Annealing at 300° C. to 360° C. provides a high magnetoresistive ratio of about 150%.

Claims (11)

1. A MTJ element in a magnetic device, comprising:

(a) a synthetic anti-ferromagnetic (SyAF) pinned layer formed on a substrate;

(b) a tunnel barrier layer on the SyAF pinned layer; and

(c) a composite free layer on the tunnel barrier layer, comprising:

(1) a crystalline magnetic layer contacting a top surface of the tunnel barrier layer; and

(2) an amorphous bilayer contacting a top surface of the crystalline magnetic layer wherein said amorphous bilayer has a lower NiFeM 1 layer and an upper NiFeM 2 layer in which M 1 and M 2 are one of Hf, Zr, Nb, Ta, or Mg, and M 1 is unequal to M 2 .

2. The MTJ element of claim 1 wherein the amorphous bilayer has a thickness between about 20 and 40 Angstroms.

3. The MTJ element of claim 1 wherein the crystalline magnetic layer is comprised of Fe, Ni, or FeB Y where y is from 0 to about 5 atomic %.

4. The MTJ element of claim 1 wherein the crystalline magnetic layer has a Fe/NiFe configuration in which the Fe layer contacts the tunnel barrier layer, and the NiFe layer is formed between the Fe layer and the amorphous bilayer.

5. The MTJ element of claim 1 wherein each of the NiFeM 1 and NiFeM 2 layers has a composition wherein M 1 and M 2 , respectively, have a content from about 5 to 30 atomic %.

6. The MTJ element of claim 3 wherein the crystalline magnetic layer is Fe and said Fe layer has a thickness of at least 6 Angstroms.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 25, 2019
From: HEADWAY TECHNOLOGIES, INC.
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 048692/0917 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 20, 2018
From: MAGIC TECHNOLOGIES, INC.
To: HEADWAY TECHNOLOGIES, INC.
Reel/Frame 047604/0081 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 18, 2018
From: CAO, WEI; HORNG, CHENG T.; KULA, WITOLD; TORNG, CHYU JIUH
To: MAGIC TECHNOLOGIES, INC.
Reel/Frame 047217/0112 →