IP Library Granted Patent US 9,562,300
Granted Patent B2
US 9,562,300 · App. 14/980,562 · Granted Feb 7, 2017

Sulfonamide based polymers for copper electroplating

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Quick Facts
Patent No.
US 9,562,300
App. No.
14/980,562
Granted
Feb 7, 2017
Kind
B2
Abstract

Sulfonamide based polymers are reaction products of sulfonamides and epoxides. The polymers may be used as levelers in copper electroplating baths, to provide good throwing power. Such reaction products may plate copper or copper alloys with good surface properties and good physical reliability.

Claims (7)

1. A method comprising:

a) providing a substrate;

b) providing a composition comprising one or more sources of copper ions, optionally one or more sources of tin ions, an electrolyte and a reaction product comprising: one or more sulfonamides or salts thereof, and one or more epoxides;

c) contacting a substrate with the composition;

d) applying a current to the substrate and the composition; and

e) depositing a copper or copper/tin alloy on the substrate.

2. The method of claim 1 , wherein the substrate comprises a plurality of one or more of through-holes, trenches and vias.

Assignments (4)
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073515/0243 →
SECURITY INTEREST Recorded Nov 3, 2025
From: QNITY ELECTRONICS, INC.
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 073517/0298 →
CHANGE OF NAME Recorded Oct 29, 2024
From: ROHM & HAAS ELECTRONIC MATERIALS LLC
To: DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC
Reel/Frame 069272/0383 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 1, 2018
From: LU, WEIJING; NIAZIMBETOVA, ZUHRA I.; RZEZNIK, MARIA ANNA
To: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Reel/Frame 045077/0173 →