IP Library › Granted Patent US 10,018,916
Granted Patent B2
US 10,018,916 · App. 14/988,575 · Granted Jul 10, 2018

Photolithography for making electrochemical measurements

Inventors: Steven A. Policastro (Waldorf, MD); Raymond C Y Auyeung (Alexandria, VA); Alberto Piqué (Crofton, MD); Farrell Martin (Waldorf, MD)
Assignee: The United States of America, as represented by the Secretary of the Navy
G03F7/2002G01N27/00G03F7/16G03F7/2053G03F7/26Y10T428/13
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Quick Facts
Patent No.
US 10,018,916
App. No.
14/988,575
Granted
Jul 10, 2018
Kind
B2
Abstract

An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising a metal sample coated with a photoresist, a region of interest, an exposed region of photoresist and unexposed region of photoresist wherein the exposed region is created by light and creating a developed region of unexposed photoresist, and an adhesive strip with a first perforated window over the region of interest and a sealed waterproof container with a second larger perforated window over the first perforated window. A method for isolating microstructural regions for electrochemical experimentation comprising providing a metal sample, identifying regions of interest, coating the metal sample, selecting regions of interest, exposing with light and creating exposed photoresist and unexposed photoresist by laser lithography without a mask, and immersing the metal sample in a developer solution and creating developed regions of unexposed photoresist.

Claims (11)

1. An apparatus for electrochemical experimentation with an isolated microstructural region on a surface consisting of:

a metal sample coated with a photoresist;

a region of interest on the metal sample;

a light source;

wherein the light source comprises laser energy of about 2.6 microJoules corresponding to a fluence of about 200 mJ/cm 2 and is a 355 nm solid state laser with maximum pulse energies of about 300 μJ and pulsewidths of about 30 ns and

comprising optoelectronic devices such as spatial light modulators or digital micromirror devices for direct modulation of the light distribution itself;

an exposed region of photoresist and unexposed region of photoresist wherein the exposed region is created by light from the light source and wherein the metal sample is immersed in a developer solution whereby removing the exposed region of photoresist and creating a developed region of unexposed photoresist; and

a water-resistant adhesive strip with a first perforated window over the region of interest and a sealed waterproof container with a second larger perforated window over the first perforated window.

2. The apparatus for electrochemical experimentation with an isolated microstructural region on a surface of claim 1

wherein the regions of interest on the sample are translated by an X-Y stage and exposed by light.

3. The apparatus for electrochemical experimentation with an isolated microstructural region on a surface of claim 1 utilizing a hard-baking step at a temperature of about 150 ° C. for about 60 minutes.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 12, 2016
From: MARTIN, FARREL; PIQUE, ALBERTO; AUYEUNG, RAYMOND C Y; POLICASTRO, STEVE
To: THE GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY OF THE NAVY
Reel/Frame 037462/0304 →
Continuity (3)
Division 13618214 · Sep 14, 2012
Provisional Application 61540093 · Sep 28, 2011
Related Publication 20160154307A1 · Jun 2, 2016