Semiconductor product with interlocking metal-to-metal bonds and method for manufacturing thereof
View Patent ↗A structure and method for performing metal-to-metal bonding in an electrical device. For example and without limitation, various aspects of this disclosure provide a structure and method that utilize an interlocking structure configured to enhance metal-to-metal bonding.
1. A method of manufacturing a semiconductor device, the method comprising:
providing a first substrate comprising a first copper contact structure, the first copper contact structure comprising a dome-shaped end;
providing a second substrate comprising a second copper contact structure, the second copper contact structure comprising a dish-shaped end that has a largest dish depth;
mating the dome-shaped end and the dish-shaped end, such that the dome-shaped end contacts the dish-shaped end at multiple points around the dome-shaped end and only at a distance into the dish-shaped end between 10% and 90% of the largest dish depth; and
pressing the mated dome-shaped end and dish-shaped end together to form a copper-to-copper bond.
2. The method of claim 1 , wherein the first copper contact structure comprises a first copper pillar.
3. The method of claim 1 , wherein at least one of the first and second copper contact structures is cylindrical.
4. The method of claim 1 , wherein the first copper contact structure comprises a first width at a widest portion thereof, and the second copper contact structure comprises a second width at a widest portion thereof that is greater than the first width.
5. The method of claim 1 , wherein at least one of the first and second substrates comprises a semiconductor die.
6. The method of claim 1 , wherein the first copper contact structure comprises a wafer bump.
7. The method of claim 1 , wherein the multiple points form a circle around a middle portion of the dome-shaped end.
8. The method of claim 1 , wherein after said pressing to form a copper-to-copper bond, the dome-shaped end contacts the dish-shaped end at a distance into the dish-shaped end greater than 90% of the largest dish depth.
9. A method of manufacturing a semiconductor device, the method comprising:
providing a first substrate comprising a first metal contact structure of a metal, the first metal contact structure comprising a convex-shaped end that comprises:
a first convex portion having a first convex radius of curvature; and
a second convex portion having a second convex radius of curvature;
providing a second substrate comprising a second metal contact structure of the metal, the second metal contact structure comprising a concave-shaped end that comprises a first concave portion having a first concave radius of curvature, wherein:
the first concave radius of curvature is less than the first convex radius of curvature; and
the first concave radius of curvature is greater than the second convex radius of curvature;
mating the convex-shaped end and the concave-shaped end, such that the second convex portion contacts the concave-shaped end at multiple points around the concave-shaped end and the first convex portion does not contact the concave shaped end; and
pressing the mated convex-shaped end and concave-shaped end together to form a metal-to-metal bond of the metal.
10. The method of claim 9 , wherein the metal comprises copper.
11. The method of claim 9 , wherein the first metal contact structure comprises a first metal post, and the second metal contact structure comprises a second metal post.
12. The method of claim 9 , wherein the first and second metal contact structures are cylindrical.
13. The method of claim 9 , wherein the first substrate comprises a first semiconductor die, and the second substrate comprises a second semiconductor die.
14. The method of claim 9 , wherein during said pressing to form a metal-to-metal bond of the metal, at least some of the first convex portion deforms and contacts the concave shaped end.
15. A method of manufacturing a semiconductor device, the method comprising:
providing a first substrate comprising a first metal contact structure of a metal, the first metal contact structure comprising a convex-shaped end;
providing a second substrate comprising a second metal contact structure of the metal, the second metal contact structure comprising a concave-shaped end that comprises a center point, an edge, and a center-to-edge distance along a surface of the concave-shaped end between the center point and the edge;
mating the convex-shaped end and the concave-shaped end, such that the convex-shaped end contacts the concave-shaped end at multiple points around the convex-shaped end and only at a distance from the center point greater than 10% of the center-to-edge distance; and
pressing the mated convex-shaped end and concave-shaped end together to form a metal-to-metal bond of the metal.
16. The method of claim 15 , wherein the metal comprises copper.
17. The method of claim 15 , wherein the first metal contact structure comprises a first metal post, and the second metal contact structure comprises a second metal post.
18. The method of claim 15 , wherein the first and second metal contact structures are cylindrical.
19. The method of claim 15 , wherein the first substrate comprises a first semiconductor die, and the second substrate comprises a second semiconductor die.
20. The method of claim 15 , wherein during said pressing to form a metal-to-metal bond of the metal, at least some of the convex-shaped end contacts the concave-shaped end at a distance from the center point less than 10% of the center-to-edge distance.