Aluminum copper clad material
An aluminum copper clad material has excellent bonding strength and includes an aluminum layer and a copper layer that are bonded without a nickel layer interposed therebetween. The aluminum layer and the copper layer are diffusion-bonded via an Al—Cu intermetallic compound layer. The copper layer satisfies Dcs≦0.5×Dcc, where Dcc represents the average crystal grain size of crystal grains in a central portion in the thickness direction of the copper layer, and Dcs represents the average crystal grain size of an interface adjacent portion C 2 in the copper layer that is about 0.5 μm apart from the interface between the copper layer and the intermetallic compound layer. The intermetallic compound layer has an average thickness of about 0.5 μm to about 10 μm.
1. A method for producing an aluminum copper clad material in which an aluminum layer and a copper layer are diffusion-bonded via an Al—Cu intermetallic compound layer, the method comprising the steps of:
preparing an aluminum plate that serves as a source of the aluminum layer and a copper plate that serves as a source of the copper layer, wherein the preparing step includes completely annealing the copper plate and subjecting it to cold rolling to set an average surface hardness which satisfies Hc>1.6×Hca, wherein Hc (Hv) represents an average surface hardness of a surface of the copper plate to be pressure-welded, and Hca (Hv) represents an average surface hardness of the completely annealed material of the copper plate;
pressure-welding the aluminum plate and the copper plate that are stacked on each other; and
diffusion-annealing the resulting pressure-welded material at an annealing temperature T (° C.) of about 150° C. to about 550° C. for an annealing time t (min) in a range satisfying the following expressions:
tmin≦t≦tmax
t max=−1.03 ×T+ 567
t min=0.5, when −0.19 ×T+ 86<0.5,
t min=−0.19 ×T +86, when −0.19 ×T +86≧0.5; wherein
in the resulting aluminum copper clad material:
the copper layer satisfies Dcs≦0.5×Dcc, where Dcc represents an average crystal grain size of crystal grains in a central portion in a thickness direction of the copper layer, and Dcs represents an average crystal grain size of an interface adjacent portion in the copper layer that is about 0.5 μm apart from an interface between the copper layer and the Al—Cu intermetallic compound layer; and
the Al—Cu intermetallic compound layer has an average thickness of about 0.5 μm to about 10 μm and includes broken up and dispersed aluminum oxide.
2. A method for producing an aluminum copper clad material in which an aluminum layer and a copper layer are diffusion-bonded via an Al—Cu intermetallic compound layer, the method comprising the steps of:
preparing an aluminum plate that serves as a source of the aluminum layer and a copper plate that serves as a source of the copper layer, wherein the preparing step includes completely annealing the aluminum plate and subjecting it to cold rolling to set an average surface hardness which satisfies Ha>1.6×Haa, where Ha (Hv) represents an average surface hardness of a surface of the aluminum plate to be pressure-welded, and Haa (Hv) represents an average surface hardness of the completely annealed material of the aluminum plate;
pressure-welding the aluminum plate and the copper plate that are stacked on each other; and
diffusion-annealing the resulting pressure-welded material at an annealing temperature T (° C.) of about 150° C. to about 550° C. for an annealing time t (min) in a range satisfying the following expressions:
tmin≦t≦tmax
t max=−1.03 ×T +567
t min=0.5, when −0.19 ×T +86 <0.5,
t min=−0.19 ×T +86, when −0.19 ×T +86≧0.5; wherein
in the resulting aluminum copper clad material:
the aluminum layer satisfies Das≦0.5×Dac, where Dac represents an average crystal grain size of crystal grains in a central portion in a thickness direction of the aluminum layer, and Das represents an average crystal grain size of an interface adjacent portion in the aluminum layer that is about 0.5 μm apart from an interface between the aluminum layer and the intermetallic compound layer; and
the intermetallic compound layer has an average thickness of about 0.5 μm to about 10 μm and includes broken up and dispersed aluminum oxide.
3. The method for producing the aluminum copper clad material according to claim 1 , wherein the annealing temperature T (° C.) is about 300° C. to about 550° C. for the annealing time t (min) in a range satisfying the following expressions:
tmin≦t≦tmax
t max=−0.90 ×T +478
t min=1.0, when −0.36 ×T +168 <1.0
t min=−0.30 ×T +168, when −0.36 ×T +168≧1.0.
4. The method for producing the aluminum copper clad material according to claim 2 , wherein the annealing temperature T (° C.) is about 300° C. to about 550° C. for the annealing time t (min) in a range satisfying the following expressions:
tmin≦t≦tmax
t max=−0.90 ×T +478
t min=1.0, when −0.36 ×T +168 <1.0
t min=−0.36 ×T +168, when −0.36 ×T +168≧1.0.
5. The method for producing the aluminum copper clad material according to claim 1 , wherein the annealing temperature T (° C.) is about 450° C. or greater and about 550° C. or less.
6. The method for producing the aluminum copper clad material according to claim 2 , wherein the annealing temperature T (° C.) is about 450° C. or greater and about 550° C. or less.
7. The method for producing the aluminum copper clad material according to claim 1 , wherein the aluminum plate is made of pure aluminum or an aluminum alloy having an electric conductivity of about 10% IACS or greater, and the copper plate is made of pure copper or a copper alloy having an electric conductivity of about 10% IACS or greater.
8. The method for producing the aluminum copper clad material according to claim 2 , wherein the aluminum plate is made of pure aluminum or an aluminum alloy having an electric conductivity of about 10% IACS or greater, and the copper plate is made of pure copper or a copper alloy having an electric conductivity of about 10% IACS or greater.