Copper foil provided with carrier, laminate, printed wiring board, and method for fabricating printed wiring board
Provided is a copper foil provided with a carrier which enables, in a laminate produced by laminating a copper foil provided with a carrier on a resin substrate, to peel the ultrathin copper layer from the carrier well. A copper foil provided with a carrier having, in order, a carrier, an intermediate layer, and an ultrathin copper layer, wherein, when the surface of the carrier opposite to the ultrathin copper layer is measured using a laser microscope based on JIS B0601-1994, the ten point average roughness Rz of the surface is 6.0 μm or less.
1. A copper foil provided with a carrier comprising, in order, a carrier, an intermediate layer, and an ultrathin copper layer, wherein at least one of the following (i-a) to (iii-a) is satisfied:
(i-a) when a surface of the carrier facing away from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-1994, a ten point average roughness Rz of the surface is 6.0 pm or less; (ii-a) when a surface of the carrier facing away from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-1994, an arithmetic average roughness Ra of the surface is 1.0 pm or less; (iii-a) when a surface of the carrier facing away from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-2001, a maximum cross-sectional height Rt in a roughness curve of the surface is 7.0 μm or less.
2. The copper foil provided with a carrier according to claim 1 , wherein at least one of the following (i-b) to (iii-b) is satisfied:
(i-b) when a surface of the carrier facing way from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-1994, a ten point average roughness Rz of the surface is 0.9 μm or more;
(ii-b) when a surface of the carrier facing way from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-1994, an arithmetic average roughness Ra of the surface is 0.12 μm or more;
(iii-b) when a surface of the carrier facing way from the ultrathin copper layer is measured using a laser microscope based on JIS B0601-2001, a maximum cross-sectional height Rt in a roughness curve of the surface is 1.1 μm or more.
3. The copper foil provided with a carrier according to claim 1 comprising one or more layers selected from the group consisting of a roughened layer, a heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer on a surface of the carrier facing way from the ultrathin copper layer.
4. The copper foil provided with a carrier according to claim 3 , wherein
the roughened layer comprises a layer consisting of a simple substance selected from the group consisting of copper, nickel, cobalt, phosphorus, tungsten, arsenic, molybdenum, chromium, and zinc, or an alloy comprising one or more thereof, and/or
comprises a layer formed using a sulfuric acid-copper sulfate electrolytic bath comprising one or more selected from the group consisting of a sulfuric acid alkyl ester salt, tungsten, and arsenic.
5. The copper foil provided with a carrier according to claim 3 comprising no roughened layer on a surface of the carrier facing way from the ultrathin copper layer, or
comprising no roughened layer and comprising one or more layers selected from the group consisting of a heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer on a surface of the carrier facing way from the ultrathin copper layer.
6. The copper foil provided with a carrier according to claim 1 comprising one or more layers selected from the group consisting of a roughened layer, a heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer on the ultrathin copper layer surface.
7. The copper foil provided with a carrier according to claim 6 , wherein the roughened layer is a layer consisting of a simple substance selected from the group consisting of copper, nickel, cobalt, phosphorus, tungsten, arsenic, molybdenum, chromium, and zinc, or an alloy comprising one or more thereof.
8. The copper foil provided with a carrier according to claim 6 comprising no roughened layer on a surface of the ultrathin copper layer, or
comprising no roughened layer and comprising one or more layers selected from the group consisting of a heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer on a surface of the ultrathin copper layer.
9. The copper foil provided with a carrier according to claim 8 comprising a resin layer on the ultrathin copper layer surface or above one or more layers selected from the group consisting of a roughened layer, the heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer formed on the ultrathin copper layer surface.
10. The copper foil provided with a carrier according to claim 9 , wherein the resin layer is a resin for adhesion and/or a resin in a semi-cured state.
11. The copper foil provided with a carrier according to claim 6 comprising a resin layer above one or more layers selected from the group consisting of a roughened layer, the heat resistant layer, an anti-corrosion layer, a chromate-treated layer, and a silane coupling-treated layer formed on the ultrathin copper layer surface.
12. A laminate comprising a copper foil provided with a carrier according to claim 1 .
13. A laminate comprising a copper foil provided with a carrier according to claim 12 and a resin, wherein a part or all of an edge face of the copper foil provided with a carrier is covered with the resin.
14. A method for fabricating a printed wiring board comprising:
a step of providing two layers of a resin layer and a circuit at least one time on one side or both sides of a laminate according to claim 12 ; and
a step of, after the two layers of the resin layer and the circuit have been formed, peeling the carrier or the ultrathin copper layer from the copper foil provided with a carrier constituting the laminate.
15. A laminate, wherein one copper foil provided with a carrier according to claim 1 is laminated from the carrier side or the ultrathin copper layer side on the carrier side or the ultrathin copper layer side of another copper foil provided with a carrier according to claim 1 .
16. A printed wiring board fabricated comprising a copper foil provided with a carrier according to claim 1 .
17. A method for fabricating a printed wiring board comprising:
forming a copper-clad laminate by carrying out
a step of preparing a copper foil provided with a carrier according to claim 1 and an insulating substrate,
a step of laminating the copper foil provided with a carrier and the insulating substrate, and
a step of, after the copper foil provided with a carrier and the insulating substrate have been laminated, peeling the carrier of the copper foil provided with a carrier; and
then forming a circuit by any of a semi-additive method, a subtractive method, a partly additive method, and a modified semi-additive method.
18. A method for fabricating a printed wiring board comprising:
a step of forming a circuit on the ultrathin copper layer side surface of a copper foil provided with a carrier according to claim 1 ;
a step of forming a resin layer on the ultrathin copper layer side surface of the copper foil provided with a carrier so that the circuit is buried;
a step of forming a circuit on the resin layer;
a step of peeling the carrier after forming the circuit on the resin layer; and
a step of exposing the circuit buried in the resin layer that is formed on the ultrathin copper layer side surface by, after the carrier has been peeled off, removing the ultrathin copper layer.
19. A method for fabricating a printed wiring board comprising:
a step of laminating a copper foil provided with a carrier according to claim 18 on a resin substrate from the carrier side;
a step of forming a circuit on the ultrathin copper layer side surface of the copper foil provided with a carrier;
a step of forming a resin layer on the ultrathin copper layer side surface of the copper foil provided with a carrier so that the circuit is buried;
a step of forming a circuit on the resin layer;
a step of peeling the carrier after forming the circuit on the resin layer; and
a step of exposing the circuit buried in the resin layer that is formed on the ultrathin copper layer side surface by, after the carrier has been peeled off, removing the ultrathin copper layer.
20. A method for fabricating a printed wiring board comprising:
a step of laminating the ultrathin copper layer side surface or the carrier side surface of a copper foil provided with a carrier according to claim 1 and a resin substrate;
a step of providing two layers of a resin layer and a circuit at least one time on the ultrathin copper layer side surface or the carrier side surface of the copper foil provided with a carrier facing way from a side with the resin substrate laminated thereon; and
a step of, after the two layers of the resin layer and the circuit have been formed, peeling the carrier or the ultrathin copper layer from the copper foil provided with a carrier.
21. A method for fabricating a printed wiring board comprising:
a step of laminating the carrier side surface of a copper foil provided with a carrier according to claim 20 and a resin substrate;
a step of providing two layers of a resin layer and a circuit at least one time on the ultrathin copper layer side surface of the copper foil provided with a carrier facing way from a side with the resin substrate laminated thereon; and
a step of, after the two layers of the resin layer and the circuit have been formed, peeling the carrier from the copper foil provided with a carrier.