IP Library Granted Patent US 9,648,759
Granted Patent B2
US 9,648,759 · App. 15/027,784 · Granted May 9, 2017

Multilayer wiring board and method for manufacturing same

Inventor: Nobuyuki Yoshida (Tokyo, JP)
Assignee: HITACHI CHEMICAL COMPANY, LTD.
H05K3/4652H05K3/421H05K3/0035H05K3/0038H05K3/422
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,648,759
App. No.
15/027,784
Granted
May 9, 2017
Kind
B2
Abstract

The present invention is a multilayer wiring board and a method for manufacturing the same, the multilayer wiring board having a hole for interlayer connection penetrating a metal foil and an insulating layer; an overhang of the metal foil formed at an opening of the hole; lower space formed between the overhang and an inside wall of the hole; and interlayer connection in which the hole is filled with electrolytic filling plating layers, wherein the electrolytic filling plating layers are formed as at least two or more layers, the lower space is filled with any electrolytic filling plating layer except for an outermost layer of the two or more layers of electrolytic filling plating layers, and a diameter in the inside of the interlayer connection formed by any electrolytic filling plating layer except for an outermost layer is equal to or larger than a diameter of the opening.

Claims (19)

1. A multilayer wiring board comprising:

a laminate formed by integrally laminating an inner layer material with an inner layer wiring pattern formed thereon, an insulating layer, and a metal foil for an upper layer wiring pattern;

a hole for interlayer connection penetrating the metal foil for an upper layer wiring pattern and the insulating layer of the laminate;

an overhang of the metal foil for an upper layer wiring pattern formed at an opening of the hole for interlayer connection;

lower space formed between the overhang of the metal foil and an inside wall of the hole for interlayer connection; and

interlayer connection in which the hole for interlayer connection is filled with electrolytic filling plating layers,

wherein the electrolytic filling plating layers that fill the hole for interlayer connection are formed as at least two or more layers,

wherein the lower space between the overhang of the metal foil for an upper layer wiring pattern formed at the opening of the hole for interlayer connection and the inside wall of the hole for interlayer connection is filled with any electrolytic filling plating layer except for an outermost layer of the two or more layers of electrolytic filling plating layers, and

a maximum diameter in the inside of the interlayer connection formed by any electrolytic filling plating layer except for an outermost layer is equal to or larger than a minimum diameter of the opening.

2. The multilayer wiring board according to claim 1 ,

wherein the interlayer connection formed by any electrolytic filling plating layer except for an outermost layer of the two or more layers of electrolytic filling plating layers has an octopus trap (tako-tsubo) shape in which the electrolytic filling plating fills the lower space between the overhang of the metal foil for an upper layer wiring pattern formed at the opening of the hole for interlayer connection and the inside wall of the hole for interlayer connection, and the maximum diameter in the inside of the interlayer connection is larger than the minimum diameter of the opening.

3. The multilayer wiring board according to claim 1 ,

wherein the electrolytic filling plating layers that fill the hole for interlayer connection are formed as two layers,

wherein the lower space between the overhang of the metal foil for an upper layer wiring pattern formed at the opening of the hole for interlayer connection and the inside wall of the hole for interlayer connection is filled with the lower electrolytic filling plating layer of the two layers of electrolytic filling plating layers, and

the maximum diameter in the inside of the interlayer connection formed by the lower electrolytic filling plating layer is equal to or larger than the minimum diameter of the opening.

4. The multilayer wiring board according to claim 1 ,

wherein the hole for interlayer connection is a non-through hole that penetrates the metal foil for an upper layer wiring pattern and the insulating layer of the laminate and reaches the inner layer wiring pattern.

5. The multilayer wiring board according to claim 1 ,

wherein the aspect ratio of the hole for interlayer connection is 1.0 or more.

Assignments (5)
MERGER Recorded Feb 3, 2023
From: LINCSTECH CO., LTD.
To: PTCJ-S HOLDINGS, CO., LTD.
Reel/Frame 062585/0259 →
CHANGE OF NAME Recorded Feb 3, 2023
From: PTCJ-S HOLDINGS, CO., LTD.
To: LINCSTECH CO., LTD.
Reel/Frame 062585/0300 →
DEMERGER Recorded Jun 14, 2022
From: SHOWA DENKO MATERIALS CO., LTD.
To: LINCSTECH CO., LTD.
Reel/Frame 060281/0643 →
CHANGE OF NAME Recorded Mar 9, 2022
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 059355/0743 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 10, 2016
From: YOSHIDA, NOBUYUKI
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 038529/0720 →
Priority Claims (3)
JP 2013-211871 · Oct 9, 2013 · national
JP 2014-147754 · Jul 18, 2014 · national
JP 2014-147755 · Jul 18, 2014 · national
Continuity (1)
Related Publication 20160242278A1 · Aug 18, 2016