Towers for substrate carriers
View Patent ↗A diffuser tower assembly having a diffuser with a flared end and a fitting with an offset portion and nipple sized for the flared end. The assembly may be configured for providing low coverage purging. Diffuser tower assemblies may be in the form of a kit for retrofitting existing front opening wafer containers. The inlet fitting may include structure that enhances purge characteristics near the base of the porous media diffuser for enhanced sweeping of the floor of the substrate container. Embodiments of the disclosure generate an uneven flow distribution that provides a non-uniform flow distribution at the opening. In an embodiment, where the opening is in a substantially vertical orientation, the non-uniform flow distribution is tailored to deliver a greater flow rate to the bottom half of the opening than to the top of the opening.
1. A porous tower diffuser assembly for use in a front opening wafer container, the diffuser assembly comprising:
an inlet fitting with a base portion, a unitary offset portion, and a unitary upwardly facing nipple, the inlet fitting configured to be seated in an aperture in a bottom wall of the front opening container;
a porous tower configured as a sintered polymer tubular portion including a lower portion, the lower portion having a larger diameter portion and engaged on the upwardly facing nipple;
the porous tower portion having at least two different portions of different resistances to radial outflow of purge gases.
2. The porous tower diffuser assembly of claim 1 wherein the upwardly facing nipple has a plurality of barbs or a thread sized for an interference fit with the porous tower.
3. The porous tower diffuser assembly of claim 2 comprising a radial aperture in the nipple.
4. The porous tower diffuser assembly of claim 1 , in combination with a front opening wafer container and a second identical porous tower diffuser assembly.
5. A front opening wafer container comprising a container portion with a front opening and a door to sealingly close the front opening, the container portion having a bottom wall, the front opening wafer container further comprising:
an inlet fitting with a base portion, a unitary offset portion, and a unitary upwardly facing nipple, the fitting seated at an aperture in the bottom wall;
a porous tower configured as a sintered polymer tubular portion including a lower portion having a larger diameter portion, the lower portion engaged on the upwardly facing nipple.
6. The front opening wafer container of claim 5 wherein the nipple has one of barbs or a thread, a radial aperture, and wherein an annularly extending space is defined between the nipple and the porous tower at the radial aperture.
7. The porous tower diffuser assembly of claim 5 further comprising a means for increasing purge towards the flared lower portion compared to a portion distal from the flared lower portion.
8. The front opening wafer container of claim 5 further comprising another inlet fitting with a base portion, a unitary offset portion, and a unitary upwardly facing nipple, the fitting seated at another aperture in the bottom wall;
another porous tower configured as a sintered polymer tubular portion and a flared lower portion, the flared lower portion engaged on the upwardly facing nipple.