IP Library › Assignment 060613/0072
Patent Assignment
Reel/Frame 060613/0072

SECURITY INTEREST

Recorded: 2022-07-08 Received: 2022-07-08 Pages: 111
Assignors
CMC MATERIALS, INC.
Executed: 2022-07-06
ENTEGRIS GP, INC.
Executed: 2022-07-06
ENTEGRIS, INC.
Executed: 2022-07-06
INTERNATIONAL TEST SOLUTIONS, LLC
Executed: 2022-07-06
POCO GRAPHITE, INC.
Executed: 2022-07-06
Assignee
TRUIST BANK, AS NOTES COLLATERAL AGENT
2713 FOREST HILLS ROAD, S.W., BUILDING 2, FLOOR 2, WILSON, NC, 27894, UNITED STATES
Covered Applications (100)
GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATION SYSTEM
App. No. 17/688,613
→
HIGH REMOVAL RATE MAGNETORHEOLOGICAL FINISHING HEAD
App. No. 17/640,234
→
SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD
App. No. 17/592,612
→
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON
App. No. 17/592,294
→
CERIA-BASED SLURRY COMPOSITIONS FOR SELECTIVE AND NONSELECTIVE CMP OF SILICON OXIDE, SILICON NITRIDE, AND POLYSILICON
App. No. 17/592,279
→
PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
App. No. 17/591,007
→
COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON
App. No. 17/584,532
→
ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE
App. No. 17/582,667
→
CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC SHELLS
App. No. 17/557,461
→
SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY
App. No. 17/557,412
→
MEMBRANES FOR ACID-SENSITIVE SOLVENTS
App. No. 17/543,362
→
MULTI-LAYER COMPOSITES WITH VARIED LAYER THICKNESSES AND RELATED METHODS
App. No. 17/541,690
→
SYSTEM AND METHOD FOR CLEANING CONTACT ELEMENTS AND SUPPORT HARDWARE USING FUNCTIONALIZED SURFACE MICROFEATURES
App. No. 17/540,943
→
POROUS POLYETHYLENE FILTER MEMBRANE, AND RELATED FILTERS AND METHODS
App. No. 17/532,773
→
PHASE-SHIFT RETICLE FOR USE IN PHOTOLITHOGRAPHY
App. No. 17/529,840
→
FILTER APPARATUS WITH VENTED CORE, ELECTROSTATIC DISCHARGE MITIGATION, OR BOTH
App. No. 17/527,870
→
FILTER APPARATUS WITH VENTED CORE
App. No. 17/527,892
→
ARTICLES COATED WITH CRACK-RESISTANT FLUORO-ANNEALED FILMS AND METHODS OF MAKING
App. No. 17/527,228
→
MODIFIED CARBON ADSORBENTS
App. No. 17/522,970
→
COATED POROUS POLYMERIC MEMBRANES
App. No. 17/522,159
→
CHEMICAL-MECHANICAL POLISHING PAD WITH TEXTURED PLATEN ADHESIVE
App. No. 17/607,743
→
LOW METAL CONTENT POLYOLEFIN FILTER MEMBRANE
App. No. 17/512,474
→
SELECTIVE ALKYLATION OF CYCLOPENTADIENE
App. No. 17/507,004
→
METHOD FOR PREPARING IODOSILANES
App. No. 17/505,685
→
ADSORBENT-TYPE STORAGE AND DELIVERY VESSELS WITH HIGH PURITY DELIVERY OF GAS, AND RELATED METHODS
App. No. 17/505,735
→
GRAFTED POLYSULFONE MEMBRANES
App. No. 17/503,986
→
UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS
App. No. 17/503,422
→
Storage and Delivery Veseel for Storing GeH4, Using a Zeolitic Adsorbent
App. No. 17/495,363
→
Post CMP Cleaning Compositions
App. No. 17/492,257
→
Filtration Membranes, Systems, and Methods for Producing Purified Water
App. No. 17/491,700
→
Method and Systems Useful for Producing Aluminum Ions
App. No. 17/492,089
→
Microelectronic Device Cleaning Composition
App. No. 17/491,750
→
Membranes for Removing Metallic Species from Amines
App. No. 17/488,897
→
Self-Locking Manifold and Filter
App. No. 17/486,127
→
Etchant Compositions
App. No. 17/480,844
→
CHEMICAL MECHANICAL PLANARIZATION PAD WITH A RELEASE LINER COMPRISING A PULL TAB
App. No. 17/478,690
→
SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS
App. No. 17/474,543
→
Ion Implantation System with Mixture of Arc Chamber Materials
App. No. 17/466,362
→
ELECTROSTATIC CHUCK WITH EMBOSSMENTS THAT COMPRISE DIAMOND-LIKE CARBON AND DEPOSITED SILICON-BASED MATERIAL, AND RELATED METHODS
App. No. 17/459,272
→
FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN NITROGEN ION IMPLANTATION
App. No. 17/411,816
→
MAIN SEAL ASSEMBLY
App. No. 17/407,934
→
NITRIDE ETCHANT COMPOSITION AND METHOD
App. No. 17/402,126
→
GAS SUPPLY PACKAGES, ADSORBENTS, AND RELATED METHODS
App. No. 17/398,891
→
SILICON CARBIDE/GRAPHITE COMPOSITE AND ARTICLES AND ASSEMBLIES COMPRISING SAME
App. No. 17/396,389
→
TITANIUM DIOXIDE CONTAINING RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY
App. No. 17/391,674
→
METHOD FOR REMOVING HARD MASKS
App. No. 17/389,879
→
COMPOSITIONS AND METHODS FOR SELECTIVELY ETCHING SILICON NITRIDE FILMS
App. No. 17/388,990
→
CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS
App. No. 17/384,940
→
SILICON WAFER POLISHING COMPOSITION AND METHOD
App. No. 17/379,279
→
CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERROELECTRIC MEMORIES
App. No. 17/375,755
→
KIT FOR INSTALLING IMPELLER INTO PROCESS VESSEL
App. No. 17/375,855
→
CONNECTION ASSEMBLY AND FILTER ASSEMBLY
App. No. 17/370,855
→
GROUP VI PRECURSOR COMPOUNDS
App. No. 17/370,722
→
COATINGS THAT CONTAIN FLUORINATED YTTRIUM OXIDE AND A METAL OXIDE, AND METHODS OF PREPARING AND USING THE COATINGS
App. No. 17/370,810
→
PROCESS FOR PREPARING ORGANOTIN COMPOUNDS
App. No. 17/366,470
→
HARD ABRASIVE PARTICLE-FREE POLISHING OF HARD MATERIALS
App. No. 17/365,916
→
ACID RESISTANT FILTER MEDIA
App. No. 17/356,201
→
SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS
App. No. 17/356,252
→
COMPOSITE FILTER MEDIA
App. No. 17/354,921
→
ION-EXCHANGE MEMBRANES, FILTERS, AND METHODS
App. No. 17/350,970
→
Bulk Process Gas Purification Systems and Related Methods
App. No. 17/340,987
→
SILICON NITRIDE ETCHING COMPOSITION AND METHOD
App. No. 17/341,138
→
METHOD OF FORMING A LAMINATED SINGLE LAYER COMPOSITE MEMBRANE
App. No. 17/320,973
→
ELECTROSTATIC CHUCK HAVING A GAS FLOW FEATURE, AND RELATED METHODS
App. No. 17/317,585
→
REGULATOR ASSEMBLY AND TEST METHOD
App. No. 17/244,650
→
RETICLE POD SEALING
App. No. 17/244,571
→
METHOD OF PREPARING IODOSILANES AND COMPOSITIONS THEREFROM
App. No. 17/239,135
→
MULTI PIECE FITMENT FOR A FLUID CONTAINER
App. No. 17/237,865
→
MODULAR FILTER MANIFOLD
App. No. 17/232,780
→
RETICLE POD HAVING COATED SENSOR ZONES
App. No. 17/232,581
→
HYDROPHOBIC MEMBRANES AND MEMBRANE DISTILLATION METHODS
App. No. 17/232,416
→
ELECTROSTATIC DISCHARGE MITIGATION DEVICE
App. No. 17/232,489
→
METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM
App. No. 17/230,633
→
YTTRIUM FLUORIDE FILMS AND METHODS OF PREPARING AND USING YTTRIUM FLUORIDE FILMS
App. No. 17/230,742
→
CMP COMPOSITION INCLUDING A NOVEL ABRASIVE
App. No. 17/217,097
→
PRECURSORS AND METHODS FOR PREPARING SILICON-CONTAINING FILMS
App. No. 17/214,701
→
MANIFOLD FOR A SUBSTRATE CONTAINER
App. No. 17/192,715
→
LIGAND-MODIFIED FILTER AND METHODS FOR REDUCING METALS FROM LIQUID COMPOSITIONS
App. No. 17/184,273
→
CMP COMPOSITION FOR POLISHING HARD MATERIALS
App. No. 17/163,372
→
METHOD FOR NUCLEATION OF CONDUCTIVE NITRIDE FILMS
App. No. 17/161,332
→
METHOD FOR ETCHING OR DEPOSITION
App. No. 17/150,942
→
POROUS SINTERED METAL BODIES AND METHODS OF PREPARING POROUS SINTERED METAL BODIES
App. No. 17/151,010
→
METAL BODY HAVING MAGNESIUM FLUORIDE REGION FORMED THEREFROM
App. No. 17/125,539
→
DERIVATIZED POLYAMINO ACIDS
App. No. 17/123,295
→
FILTER LIFE INDICATOR MEDIA AND HOLDER
App. No. 17/124,375
→
SPIRALING POLYPHASE ELECTRODES FOR ELECTROSTATIC CHUCK
App. No. 17/122,959
→
ACCURATE TEMPERATURE READING OF FLUID NEAR INTERFACE
App. No. 17/116,738
→
DIFFUSION BARRIERS MADE FROM MULTIPLE BARRIER MATERIALS, AND RELATED ARTICLES AND METHODS
App. No. 17/115,196
→
HALOALKYNYL DICOBALT HEXACARBONYL PRECURSORS FOR CHEMICAL VAPOR DEPOSITION OF COBALT
App. No. 16/952,985
→
GERMANIUM TETRAFLOURIDE AND HYDROGEN MIXTURES FOR AN ION IMPLANTATION SYSTEM
App. No. 17/055,885
→
DENSIFIED SOLID PREFORMS FOR SUBLIMATION
App. No. 17/097,855
→
ENVIRONMENTAL CONTROL MATERIAL HOLDER
App. No. 17/091,642
→
RETICLE POD HAVING SIDE CONTAINMENT OF RETICLE
App. No. 17/089,987
→
COMPOSITION AND METHOD FOR DIELECTRIC CMP
App. No. 17/077,155
→
COMPOSITION AND METHOD FOR SELECTIVE OXIDE CMP
App. No. 17/077,485
→
POLISHING COMPOSITION AND METHOD WITH HIGH SELECTIVITY FOR SILICON NITRIDE AND POLYSILICON OVER SILICON OXIDE
App. No. 17/076,989
→
COMPOSITION AND METHOD FOR SILICON OXIDE AND CARBON DOPED SILICON OXIDE CMP
App. No. 17/077,295
→
COMPOSITION AND METHOD FOR DIELECTRIC CMP
App. No. 17/077,070
→
SELF-STOPPING POLISHING COMPOSITION AND METHOD
App. No. 17/077,414
→
FILTER WITH IMPROVED FLUID FLOW
App. No. 17/076,204
→