CMP composition for polishing hard materials
A slurry for chemical mechanical polishing (CMP) includes an aqueous liquid carrier, an oxygen and anion containing transition metal compound or polyatomic cations including a transition metal and oxygen or hydrogen, and a per-based oxidizer. The anion for the oxygen and anion containing transition metal compound can include oxynitrate, oxychloride, oxyhydroxide, oxyacetate, oxysulfide, or oxysulfate. The per-based oxidizer can be a permanganate compound.
1. A slurry for chemical mechanical polishing (CMP), comprising:
an aqueous liquid carrier;
a transition metal oxy compound chosen from oxy-nitrates, oxy-chlorides, oxysulfates, oxy-carbonates, and C2-C10 oxy-alkanoates; and
a per-based oxidizer, wherein the per-based oxidizer has a cation to anion ratio (CAR) value varying between 0.0 to 1.0; further comprising from about 0.001 to about 3% by weight abrasive oxide particles, wherein the abrasive oxide particles comprise zirconia or alumina, and has an isoelectric point (IEP) value of 0.5 to 4.0.
2. The slurry of claim 1 , comprising
a) water;
b) a per-based oxidizer; and
c) at least one compound which forms a cation in solution chosen from ZrO+, ZrO++, NiO+, ZrOH+, HfO+, HfOH+, TiO+, and TiO++; and
wherein the pH is about 1 to about 5.
3. The slurry of claim 1 , wherein the per-based oxidizer is chosen from potassium permanganate and sodium permanganate.
4. The slurry of claim 2 , wherein the slurry comprises c) and is chosen from zirconium oxynitrate, zirconium oxychloride, nickel oxynitrate, nickel oxychloride, hafnium oxynitrate, hafnium oxychloride, and zirconium C2-C10 oxy-alkanoates.
5. The slurry of claim 1 , further comprising at least one surfactant.
6. The slurry of claim 1 , wherein the slurry comprises the polyatomic cations, and wherein the concentration of the polyatomic cations is 0.01 gm/liter to 20 gm/liter.
7. The slurry of claim 1 , wherein the slurry comprises c) and is chosen from zirconium oxynitrate, zirconium oxychloride, nickel oxynitrate, nickel oxychloride, hafnium oxynitrate, hafnium oxychloride, and zirconium C2-C10 oxy-alkanoates.
8. The slurry of claim 2 , wherein the per-based oxidizer comprises a permanganate compound in a concentration from 0.01 M to 0.5 M.
9. The slurry of claim 1 , wherein a density of the abrasive oxide particles is 10% to 90% of a theoretical density of the abrasive oxide particles.