Cleaning systems and methods for semiconductor substrate storage articles
View Patent ↗Provided are methods and systems for cleaning various semiconductor substrate storage articles, in particular, FOUP doors. The FOUP doors and other similar articles often have openings that may get contaminated with cleaning liquids if not covered. The described cleaning system includes contact points for engaging the article and covering these openings. The contact points may be also used for supporting the article and for pressurizing the openings in the article with a gas. The gas may be supplied through one or more contact points. It prevents liquids from getting into the openings if even the openings are not completely sealed. The pressurization may be maintained through the entire wet portion of the cleaning process. The article may be rotated within the cleaning system while cleaning and/or other liquids or gases are dispensed through a set of spraying nozzles. Spraying nozzles may move to enhance cleaning of the article.
1. A method for cleaning an article, the method comprising:
protecting an opening in an exterior surface of the article with a gas flow from a nozzle;
supplying the gas flow from the nozzle which is spaced apart from the exterior surface such that a gap exists between the nozzle and the exterior surface, so that the gas flow from the nozzle impinges the opening in the exterior surface; and
cleaning the article with a liquid while the gas flow, impinging the opening, substantially prevents the liquid from entering the opening.
2. The method of claim 1 , further comprising aligning the gas flow with the opening.
3. The method of claim 1 , wherein the opening comprises an object, wherein
the object is configured to be slidable in the opening, or
the object is positioned in the opening with a gap, wherein the length of the object is at least 10× greater than the gap.
4. The method of claim 1 , wherein the opening comprises
a cavity, wherein the cavity has an aperture at a surface of the article, wherein a dimension of the aperture is smaller than a dimension of the cavity, or
a hole, wherein the hole has an aperture at a surface of the article, wherein the hole has a depth, wherein the ratio of the depth and a dimension of the aperture is higher than 20:1.
5. The method of claim 1 , wherein protecting the opening comprises one of
supplying the gas flow into the opening,
applying the gas flow toward the opening to minimize liquid entering the opening,
blocking the opening from being exposed to the liquid,
pressurizing the opening with the gas flow, or
applying a contact point at the opening, and applying the gas flow to the contact point.
6. The method claim 1 , wherein cleaning the article comprises
flowing a liquid toward the article, or
submerging the article in a liquid.